公开(公告)号：EP1553406B1

公开(公告)日：2013-02-13

申请号：EP04028745.0

申请日：2004-12-03

Applicant: Candela Instruments

Inventor： Meeks, Steven W.

IPC: G01N21/47 ,  G01N21/21 ,  G01N21/95 ,  G01B11/06 ,  G01B11/30

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：EP1553406A1

公开(公告)日：2005-07-13

申请号：EP04028745.0

申请日：2004-12-03

Applicant: Candela Instruments

Inventor： Meeks, Steven W.

IPC: G01N21/95 ,  G01N21/47 ,  H01L21/66

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.

Abstract translation: 提出了一种双面光学检测系统，其可以在表面的单次扫描中检测和分类薄膜盘或晶片上的颗粒，凹坑和划痕。 在一个实施例中，本发明使用一对正交取向的激光束，一个在径向上，一个在圆周方向上在晶片或薄膜盘的两个表面上。 来自径向和周向光束的散射光通过它们的偏振分离，或者通过使用二向色镜与两种不同的激光波长分离。

公开(公告)号：EP2378273A3

公开(公告)日：2012-03-14

申请号：EP10182395.3

申请日：2004-12-03

Applicant: Candela Instruments

Inventor： Meeks, Steven W.

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for measuring a defect on a surface of an object (4501), comprising:
directing a first light beam in a first plane of incidence toward a first position on the object (4501);
directing a second light beam in a second plane of incidence toward a second position on the object (4501), wherein the angle between the first plane of incidence and the second plane of incidence is zero and wherein the first light beam is directed in a circumferential direction (4504) and the second light beam is directed in a radial direction of said object (4501);
detecting a first scattered light beam; and
detecting a second scattered light beam; wherein the first scattered light beam comprises scattered light intensity from the first position and the second scattered light beam comprises scattered light intensity from the second position, the method further comprising a step of comparing the first scattered light beam and the second scattered light beam to determine a first aspect ratio of a defect on the surface of the object (4501).

公开(公告)号：EP2378273A2

公开(公告)日：2011-10-19

申请号：EP10182395.3

申请日：2004-12-03

Applicant: Candela Instruments

Inventor： Meeks, Steven W.

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.

Abstract translation: 一种用于测量物体表面上的缺陷的方法，包括：将第一光束在第一入射平面中朝向物体上的第一位置引导; 将第二光束引导到物体（4501）上的第二位置的第二入射平面中，其中第一入射平面和第二入射平面之间的角度为零，并且其中第一光束被引导在圆周 方向（4504），并且所述第二光束被引导在所述物体（4501）的径向方向上; 检测第一散射光束; 并检测第二散射光束; 其中所述第一散射光束包括来自所述第一位置的散射光强度，并且所述第二散射光束包括来自所述第二位置的散射光强度，所述方法还包括比较所述第一散射光束和所述第二散射光束以确定 物体表面上的缺陷的第一纵横比（4501）。