公开(公告)号：WO2011139445A1

公开(公告)日：2011-11-10

申请号：PCT/US2011/030966

申请日：2011-04-01

Applicant: CREATV MICROTECH, INC. ,  MAKAROVA, Olga V. ,  TANG, Cha-Mei ,  AMSTUTZ, Platte T

Inventor： MAKAROVA, Olga V. ,  TANG, Cha-Mei ,  AMSTUTZ, Platte T

IPC: B01D39/00

CPC classification number: B01D39/1692 ,  B01D67/0027 ,  B01D67/0034 ,  B01D67/0088 ,  B01D69/12 ,  B01D71/46 ,  B01D2239/0478 ,  B01D2323/345 ,  B01D2325/08

Abstract: A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.

Abstract translation: 一种包含由环氧基可光定影干膜形成的聚合物层的微过滤器，以及遍及聚合物层的多个孔。 还公开了一种形成微过滤器的方法。 该方法包括提供设置在基底上的第一层环氧基光可定义干膜，将第一层暴露于能量通过掩模，以在第一层干膜中形成由掩模限定的图案， 从曝光的第一层干膜，具有延伸穿过其中的多个孔的聚合物层，所述多个孔具有由图案限定的分布，以及从基底去除聚合物层。

公开(公告)号：EP2566598A1

公开(公告)日：2013-03-13

申请号：EP11777762.3

申请日：2011-04-01

Applicant: Creatv Microtech, Inc.

Inventor： MAKAROVA, Olga V. ,  TANG, Cha-Mei ,  AMSTUTZ, Platte T

IPC: B01D39/00

Abstract: A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.

公开(公告)号：EP2566598B1

公开(公告)日：2020-06-03

申请号：EP11777762.3

申请日：2011-04-01

Applicant: Creatv Microtech, Inc.

Inventor： MAKAROVA, Olga V. ,  TANG, Cha-Mei ,  AMSTUTZ, Platte T

IPC: B01D39/00