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公开(公告)号:KR20180056811A
公开(公告)日:2018-05-29
申请号:KR20187014291
申请日:2010-08-27
Applicant: DOWA ELECTRONICS MATERIALS CO , PCHEM ASS INC
Inventor: JABLONSKI GREGORY A , MASTROPIETRO MICHAEL A , SATO KIMITAKA , MIYOSHI HIROMASA , FUJITA HIDEFUMI
IPC: B22F9/00 , B22F1/00 , B22F3/00 , B22F3/04 , B22F3/10 , B22F3/14 , B22F3/15 , B22F5/04 , B22F5/08 , B22F5/10 , B22F5/12
CPC classification number: C22C5/06 , B22F1/0022 , B22F1/0062 , B22F9/24 , B22F2301/255 , B22F2304/054 , B82Y30/00 , C23C24/087 , C23C24/106 , H05K1/097 , H05K2201/0145 , H05K2201/10098 , Y10T428/24802 , Y10T428/24909
Abstract: 저온단시간소성으로소결하여, 기판과의밀착성이양호하며, 또한저저항인은 도전성막·배선의작성이가능한은나노입자조성물및 그것을이용한물품을제공한다. 용매의주성분이물이며, 조성물의 pH가 5.3 내지 8.0의범위에있고, 그조성물에포함되는은나노입자는유기산혹은그 유도체에의해보호되며, 이들유기산혹은그 유도체의함유량이은에대해 2 내지 20질량%의범위에있는것을특징으로하는은나노입자조성물을제공한다.
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公开(公告)号:CA2759785A1
公开(公告)日:2012-02-27
申请号:CA2759785
申请日:2010-08-27
Applicant: DOWA ELECTRONICS MATERIALS CO , PCHEM ASSOCIATES INC
Inventor: JABLONSKI GREGORY A , MASTROPIETRO MICHAEL A , SATO KIMITAKA , MIYOSHI HIROMASA , FUJITA HIDEFUMI
Abstract: A silver nanoparticle composition is provided which is possible to be sintered through sintering at a low temperature in a short time and to form silver electro conductive film and wiring which is favorable for adhesion to a substrate and low in resistance, and articles using the same are provided. The silver nanoparticle composition is provided, wherein a main component of a solvent is water, a pH of the composition is within a range of 5.3 to 8.0, a silver nanoparticle included in the composition is protected by an organic acid or a derivative thereof, and the content of the organic acid or the derivative thereof with respect to silver is 2 to 20% by mass. [Selected drawing] None
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公开(公告)号:DE602005004209T2
公开(公告)日:2009-01-02
申请号:DE602005004209
申请日:2005-08-16
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: SATO KIMITAKA
Abstract: Alloy particles of an alloy having a face-centered cubic structure comprise at least one selected from Fe and Co and at least one selected from Pt and Pd as principal components. The alloy particles have a TEM-measured average grain size (D TEM ) of not more than 50 nm, and a single crystallinity (D TEM )/(D X ) that is less than 1.50, where (D X ) is X-ray crystallite size. These alloy particles can be advantageously manufactured by using the polyol process to synthesize the alloy particles in the presence of a complexing agent.
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公开(公告)号:SG11201505831TA
公开(公告)日:2015-08-28
申请号:SG11201505831T
申请日:2013-02-01
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: FUJITA HIDEFUMI , KONNO SHINICHI , SATO KIMITAKA , UEYAMA TOSHIHIKO
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公开(公告)号:SG178823A1
公开(公告)日:2012-05-30
申请号:SG2011073053
申请日:2010-08-27
Applicant: DOWA ELECTRONICS MATERIALS CO , PCHEM ASSOCIATES INC
Inventor: MASTROPIETRO MICHEAL A , SATO KIMITAKA , MIYOSHI HIROMASA , FUJITA HIDEFUMI
Abstract: LOW-TEMPERATURE SINTERED SILVER NANOPARTICLE COMPOSITION AND ELECTRONIC ARTICLES FORMED USING THE SAMEAbstractA silver nanoparticle composition is provided which is5 possible to be sintered through sintering at a low temperature in a short time and to form silver electro conductive film and wiring which is favorable for adhesion to a substrate and low in resistance, and articles using the same are provided. The silver nanoparticle composition is provided, wherein a main10 component of a solvent is water, a pH of the composition is within a range of 5.3 to 8.0, a silver nanoparticle included in the composition is protected by an organic acid or a derivative thereof, and the content of the organic acid or the derivative thereof with respect to silver is 2 to 20% by mass. when published
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公开(公告)号:DE602005003722T2
公开(公告)日:2008-11-27
申请号:DE602005003722
申请日:2005-08-04
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: SATO KIMITAKA
Abstract: The invention provides a powder of fine particles of an alloy of platinum-family metal having a surface with a large amount of unevenness that is suitable as a catalyst metal. It is a powder of an alloy containing T and M in a composition ratio represented by the formula [ T X M 1 -X ], where T is one or two or more of the elements Fe, Co and Ni, M is one or two or more of the elements Pt, Pd and Ru, X represents a numerical value in the range 0.1-0.9, and wherein: its average grain size as measured under TEM observation ( D TEM ) is 50 nm or less, and under TEM observation, a plurality of protruding points is observed on the surface of the particles and indentations are observed between the protruding points, making it a fine powder of alloy particles with an uneven surface. This powder of fine alloy particles has a crystal structure with a face-centered cubic (fcc) structure, and its single crystallinity ( D TEM )/( D X ) is 1.50 or greater. In addition, the average grain size of the alloy particles as found by the dynamic light-scattering method is 50 nm or less.
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公开(公告)号:DE60323703D1
公开(公告)日:2008-11-06
申请号:DE60323703
申请日:2003-03-06
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: MATSUMOTO KAZUYUKI , SATO KIMITAKA , FUJINO TAKATOSHI , INOUE KENICHI
Abstract: A ferromagnetic iron alloy powder for a magnetic recording medium is composed of acicular iron-base particles of an average major axis length (X) of not less than 20 nm and not greater than 80 nm and have oxygen content of not less than 15 wt% and coercive force (Hc) of not less than Ä0.0036 X - 1.1 X + 110 X - 1390 (Oe)Ü (where X is average major axis length expressed in nm). The ferromagnetic iron alloy powder is obtained by reacting metal powder composed of acicular iron-base particles having an average major axis length of not less than 20 nm and not greater than 80 nm with pure water in substantial absence of oxygen to form a metal oxide film on the particle surfaces. Optionally, the particles can be reacted with a weak oxidizing gas by a wet or dry method.
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公开(公告)号:HK1213362A1
公开(公告)日:2016-06-30
申请号:HK16101123
申请日:2016-02-01
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: FUJITA HIDEFUMI , KONNO SHINICHI , SATO KIMITAKA , UEYAMA TOSHIHIKO
IPC: H01B20060101 , H01P20060101 , H01Q20060101
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公开(公告)号:HK1186750A1
公开(公告)日:2014-03-21
申请号:HK13114325
申请日:2013-12-27
Applicant: DOWA ELECTRONICS MATERIALS CO
Inventor: WARGO CHRISTOPHER J J , SATO KIMITAKA
IPC: C11D20060101 , B08B20060101
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10.
公开(公告)号:AU2010349580A1
公开(公告)日:2012-03-15
申请号:AU2010349580
申请日:2010-08-27
Applicant: DOWA ELECTRONICS MATERIALS CO , PCHEM ASSOCIATES INC
Inventor: JABLONSKI GREGORY A , MASTROPIETRO MICHAEL A , SATO KIMITAKA , MIYOSHI HIROMASA , FUJITA HIDEFUMI
Abstract: Abstract A silver nanoparticle composition is provided which is possible to be sintered through sintering at a low temperature in a short time and to form silver electro conductive film and 5 wiring which is favorable for adhesion to a substrate and low in resistance, and articles using the same are provided. The silver nanoparticle composition is provided, wherein a main component of a solvent is water, a pH of the composition is within a range of 5.3 to 8.0, a silver nanoparticle included o in the composition is protected by an organic acid or a derivative thereof, and the content of the organic acid or the derivative thereof with respect to silver is 2 to 20% by mass. [Selected drawing] None 2857110_1 (GHMatteis) P88443.AU
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