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    정공 수송 물질
    2.
    发明公开
    정공 수송 물질 审中-公开
    空穴传输材料

    公开(公告)号：KR20180030220A

    公开(公告)日：2018-03-21

    申请号：KR20187006410

    申请日：2016-08-04

    Applicant: DU PONT

    Inventor： RADU NORA SABINA ,  FENNIMORE ADAM ,  HOERTER TIFFANY N ,  ROSSI GENE M

    IPC: H01L51/00 ,  H01L51/50

    CPC classification number: H01L51/0035 ,  C08G2261/1412 ,  C08G2261/148 ,  C08G2261/224 ,  C08G2261/312 ,  C08G2261/3162 ,  C08G2261/512 ,  C08G2261/598 ,  C08G2261/95 ,  H01L51/5056

    Abstract: 유기전자장치구조는애노드층인제1 전기접촉층및 캐소드층인제2 전기접촉층, 및이들사이의광활성층을갖는다. 애노드에인접하여, 종종버퍼층이라지칭되는정공주입층이있을수 있다. 정공주입층에인접하여, 정공수송물질을포함하는정공수송층이있을수 있고, 새로운화합물이정공수송물질로서유용하다. 캐소드에인접하여, 전자수송물질을포함하는전자수송층이있을수 있다.

    Abstract translation: 的有机电子器件结构具有在西班牙第一电接触层的阳极层和在西班牙第二电接触层的阴极层，和它们之间的光活性层。 邻近阳极，可以有空穴注入层，有时称为缓冲层。 邻近于空穴注入层，iteulsu包含空穴传输材料的空穴传输层，并且是有用的新化合物作为空穴传输材料。 邻近阴极，可以有含电子传输材料的电子传输层。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    5.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：WO2011159876A2

    公开(公告)日：2011-12-22

    申请号：PCT/US2011040657

    申请日：2011-06-16

    Applicant: DU PONT ,  PARK KYUNG-HO ,  RADU NORA SABINA ,  JOHANSSON GARY A ,  DELANEY WILLIAM J ,  FENNIMORE ADAM ,  LECLOUX DANIEL DAVID

    Inventor： PARK KYUNG-HO ,  RADU NORA SABINA ,  JOHANSSON GARY A ,  DELANEY WILLIAM J ,  FENNIMORE ADAM ,  LECLOUX DANIEL DAVID

    IPC: G03F7/039

    CPC classification number: B05D3/06 ,  C08G2261/3162 ,  C08G2261/95 ,  G03F7/027 ,  G03F7/405 ,  H01L51/0004 ,  H01L51/0035 ,  H01L51/50 ,  H01L51/5048 ,  H01L51/52 ,  H01L51/56

    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer. The priming material has Formula I or Formula I': In Formula I or Formula I': Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.

    Abstract translation: 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，从而产生具有起泡层图案的第一层，其中底漆层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的起动层的图案上的液体沉积形成第二层。 起始材料具有式I或式I'：在式I或式I'中：Ar 1和Ar 2相同或不同，为芳基; R 1至R 5各自独立地相同或不同，为D，F，烷基，芳基，烷氧基，甲硅烷基或可交联基团; R6是H，D或卤素; a至e独立地为0至4的整数; f为1或2; g为0,1或2; h为1或2; 并且n是大于0的整数。

    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME
    6.
    发明申请
    PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME 审中-公开
    用于制造包含层的工艺和材料及其制品

    公开(公告)号：WO2012109609A3

    公开(公告)日：2013-01-03

    申请号：PCT/US2012024750

    申请日：2012-02-10

    Applicant: DU PONT ,  PARK KYUNG-HO ,  RADU NORA SABINA ,  DOBBS KERWIN D ,  FENNIMORE ADAM

    Inventor： PARK KYUNG-HO ,  RADU NORA SABINA ,  DOBBS KERWIN D ,  FENNIMORE ADAM

    IPC: H01L51/50 ,  C07C211/54 ,  H01L51/56

    CPC classification number: H01L51/0002 ,  G03F7/038 ,  G03F7/0755 ,  G03F7/325 ,  H01L51/0003 ,  H01L51/0059 ,  H01L51/56

    Abstract: There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of developed priming layer, wherein the pattern of developed priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of developed priming layer on the first layer. The priming material has at least one unit of Formula I In Formula I: R1 through R6 are D, alkyl, aryl, or silyl, where adjacent R groups can join together to form an aromatic ring; X is a single bond, H, D, or a leaving group;Y is H, D, alkyl, aryl, silyl, or vinyl; a-f are an integer from 0-4; m, p and q are an integer of 0 or greater.

    Abstract translation: 提供了一种用于在第一层上形成包含的第二层的方法，包括以下步骤：形成具有第一表面能的第一层; 用起动材料处理第一层以形成起动层; 以辐射模式曝光引发层，导致曝光区域和未曝光区域; 开发底漆层以有效地从未曝光区域去除底漆层，从而产生具有显影起泡层图案的第一层，其中显影起始层的图案具有高于第一表面能的第二表面能; 以及通过在第一层上的显影起始层的图案上的液体沉积形成第二层。 起始材料具有式I中至少一个单元。在式I中：R 1至R 6为D，烷基，芳基或甲硅烷基，其中相邻的R基团可以连接在一起形成芳环; X是单键，H，D或离去基团; Y是H，D，烷基，芳基，甲硅烷基或乙烯基; a-f是0-4的整数; m，p和q是0以上的整数。

    ELECTROACTIVE MATERIALS
    10.
    发明申请
    ELECTROACTIVE MATERIALS 审中-公开
    电动材料

    公开(公告)号：WO2012087930A3

    公开(公告)日：2012-10-04

    申请号：PCT/US2011065834

    申请日：2011-12-19

    Applicant: DU PONT ,  RADU NORA SABINA ,  FENNIMORE ADAM

    Inventor： RADU NORA SABINA ,  FENNIMORE ADAM

    IPC: C07C211/60 ,  C08G61/12 ,  H01L51/00

    CPC classification number: H01L51/006 ,  C07C211/61 ,  C07C2603/94 ,  C08G61/12 ,  C08G2261/3162 ,  C08G2261/3424 ,  C08G2261/512 ,  C08G2261/5222 ,  C08G2261/95 ,  C09K11/06 ,  H01L51/0035 ,  H01L51/0059

    Abstract: There is disclosed a compound having Formula (I), Ar1 through Ar4 are the same or different and are aryl groups; L is a spiro group, an adamantyl group, bicyclic cyclohexyl, deuterated analogs thereof, or substituted derivatives thereof; R1 is the same or different at each occurrence and is D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group, where adjacent R1 groups can be joined together to form an aromatic ring; R2 is the same or different at each occurrence and is H, D, or halogen; a is the same or different at each occurrence and is an integer from 0-4; and n is an integer greater than 0.

    Abstract translation: 公开了具有式（I）的化合物，Ar 1〜Ar 4相同或不同，为芳基; L是螺基，金刚烷基，双环环己基，氘代类似物或其取代衍生物; R 1在每次出现时相同或不同，为D，F，烷基，芳基，烷氧基，甲硅烷基或可交联基团，其中相邻的R 1基团可以连接在一起形成芳环; R2在每次出现时相同或不同，为H，D或卤素; a在每次出现时相同或不同，为0-4以上的整数; 并且n是大于0的整数。

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