Abstract:
The present invention relates to a method of manufacturing an MEMS device, in particular, an MEMS switch, comprising the steps of forming posts and a conduction (transmission) line over a substrate and forming a membrane over the posts and the conduction line comprising forming a first membrane layer and a second membrane layer over the first membrane layer in a region over one of the posts and/or a region over the conduction line such that the first membrane layer has a region where the second membrane layer is not formed adjacent to the region where the second membrane layer is formed. Moreover, it is provided an MEMS device, in particular, an MEMS switch, comprising posts and a conduction (transmission) line formed over a substrate and a membrane over the posts and the conduction line. The membrane comprises a first membrane layer and a second membrane layer formed over the first membrane layer in a region over one of the posts and/or a region over the conduction line such that the first membrane layer has a region where the second membrane layer is not formed adjacent to the region where the second membrane layer is formed.