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公开(公告)号:CA2277067A1
公开(公告)日:1998-08-06
申请号:CA2277067
申请日:1998-01-30
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HAHN JOHN , DALTON WILLIAM M , HEIMANN ROBERT L , PRICE DAVID M
Abstract: The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a mineral containing coating or film upon a metallic or conductive surface.
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公开(公告)号:AU4003695A
公开(公告)日:1996-05-15
申请号:AU4003695
申请日:1995-10-19
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , DALTON WILLIAM M , WEBB DAVID R
Abstract: A system is disclosed for inhibiting the corrosion of ferrous and other metals by passivating the metals. The system includes novel buffered compositions which may be applied to metal products for preventing or retarding corrosion and methods for applying the buffered compositions to metal products such that corrosion protection of the products is achieved through passivation. The methods include an in-situ application to existing structures with metal reinforcement as well as applications to metal products during manufacture. Generally, the compositions may be in various forms and comprise a carrier component and one or more pH buffer components. The buffer is selected to retain the proximity of the metal at a pH at which the metal is passive to corrosion. The compositions are environmentally friendly and are capable of replacing chromates which have been traditionally used with zinc and zinc alloys to inhibit corrosion of metals but which are potentially harmful to the environment.
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公开(公告)号:CA2203181C
公开(公告)日:2001-08-07
申请号:CA2203181
申请日:1995-10-19
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: WEBB DAVID R , HEIMANN ROBERT L , DALTON WILLIAM M
Abstract: A system is disclosed for inhibiting the corrosion of ferrous and other meta ls by passivating the metals. The system includes novel buffered compositions which may be applied to metal products for preventing or retarding corrosion and methods for applying the buffered compositions to metal products such th at corrosion protection of the products is achieved through passivation. The methods include an in-situ application to existing structures with metal reinforcement as well as applications to metal products during manufacture. Generally, the compositions may be in various forms and comprise a carrier component and one or more pH buffer components. The buffer is selected to retain the proximity of the metal at a pH at which the metal is passive to corrosion. The compositions are environmentally friendly and are capable of replacing chromates which have been traditionally used with zinc and zinc alloys to inhibit corrosion of metals but which are potentially harmful to t he environment.
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公开(公告)号:CA2203181A1
公开(公告)日:1996-05-02
申请号:CA2203181
申请日:1995-10-19
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: DALTON WILLIAM M , HEIMANN ROBERT L , WEBB DAVID R
Abstract: A system is disclosed for inhibiting the corrosion of ferrous and other meta ls by passivating the metals. The system includes novel buffered compositions which may be applied to metal products for preventing or retarding corrosion and methods for applying the buffered compositions to metal products such th at corrosion protection of the products is achieved through passivation. The methods include an in-situ application to existing structures with metal reinforcement as well as applications to metal products during manufacture. Generally, the compositions may be in various forms and comprise a carrier component and one or more pH buffer components. The buffer is selected to retain the proximity of the metal at a pH at which the metal is passive to corrosion. The compositions are environmentally friendly and are capable of replacing chromates which have been traditionally used with zinc and zinc alloys to inhibit corrosion of metals but which are potentially harmful to t he environment.
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公开(公告)号:AU6258998A
公开(公告)日:1998-08-25
申请号:AU6258998
申请日:1998-01-30
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , MCGOWAN NANCY M , DALTON WILLIAM M
IPC: C10M169/04 , C10M169/06 , C10M169/00
Abstract: The disclosure relates to improved gel/grease compositions as well as grease compositions capable of imparting improved corrosion resistance. The grease includes a silica/silicate mixture that can imparts a relatively high pH and corrosion resistant properties to the grease.
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公开(公告)号:CA2277062A1
公开(公告)日:1998-08-06
申请号:CA2277062
申请日:1998-01-30
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , DALTON WILLIAM M , MCGOWAN NANCY M
IPC: C10M169/04 , C10M169/06 , C10M169/00
Abstract: The disclosure relates to improved gel/grease compositions as well as grease compositions capable of imparting improved corrosion resistance. The grease includes a silica/silicate mixture that can impart a relatively high pH and corrosion resistant properties to the grease.
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公开(公告)号:CA2277067C
公开(公告)日:2010-01-26
申请号:CA2277067
申请日:1998-01-30
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , DALTON WILLIAM M , HAHN JOHN , PRICE DAVID M
Abstract: The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a mineral containing coating or film upon a metallic or conductive surface.
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公开(公告)号:AU6256898A
公开(公告)日:1998-08-25
申请号:AU6256898
申请日:1998-01-30
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , MCGOWAN NANCY M , DALTON WILLIAM M , WEBB DAVID R , PRICE DAVID L
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公开(公告)号:CA2387813C
公开(公告)日:2014-08-12
申请号:CA2387813
申请日:2001-03-22
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HEIMANN ROBERT L , DALTON WILLIAM M , HAHN JOHN , PRICE DAVID M , SOUCIE WAYNE L , RAVI CHANDRAN
Abstract: A method for treating a substrate having an electrically conductive surface. The method includes: contacting at least a portion of the surface with a medium comprising at least one silicate and having a basic pH and wherein less than 5 wt% of chromates is present in the medium, introducing a current to said medium using a cathode and an anode wherein said surface is employed as the cathode under conditions and for a time sufficient to form a film comprising silica upon the surface; recovering a treated surface by removing said surface from the medium; and applying at least one coating which comprises latex, silanes, epoxies, silicone, amines, alkyds, urethanes or acrylics on the treated surface.
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公开(公告)号:CA2387813A1
公开(公告)日:2001-09-27
申请号:CA2387813
申请日:2001-03-22
Applicant: ELISHA TECHNOLOGIES CO L L C
Inventor: HAHN JOHN , DALTON WILLIAM M , PRICE DAVID M , SOUCIE WAYNE L , HEIMANN ROBERT L , RAVI CHANDRAN
Abstract: The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an energy enhanced proce ss to deposit a silicate containing coating or film upon a metallic or conducti ve surface.
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