公开(公告)号：US20210391274A1

公开(公告)日：2021-12-16

申请号：US17354705

申请日：2021-06-22

Applicant: EPISTAR CORPORATION

Inventor： Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L23/532 ,  H01L33/12 ,  H01L33/28 ,  H01L21/02 ,  H01L21/285 ,  H01L21/768 ,  H01L33/32 ,  H01L33/04 ,  H01L33/14 ,  H01L33/06

Abstract: A semiconductor device includes: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region between the first semiconductor structure and the second semiconductor structure, wherein the active region includes multiple alternating well layers and barrier layers, wherein each of the barrier layers has a band gap, the active region further includes an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region, wherein the electron blocking region includes a band gap, and the band gap of the electron blocking region is greater than the band gap of one of the barrier layers; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the electron blocking region; a confinement layer between the first aluminum-containing layer and the active region, wherein the confinement layer includes a thickness smaller than the thickness of one of the barrier layers; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies in the electron blocking region.

公开(公告)号：US20230144521A1

公开(公告)日：2023-05-11

申请号：US18094185

申请日：2023-01-06

Applicant: EPISTAR CORPORATION

Inventor： Chia-Ming LIU ,  Chang-Hua HSIEH ,  Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L33/26 ,  H01L33/14 ,  H01L33/06 ,  H01L33/30 ,  H01L33/32

CPC classification number: H01L33/26 ,  H01L33/145 ,  H01L33/06 ,  H01L33/305 ,  H01L33/325

Abstract: A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region between the first semiconductor structure and the second semiconductor structure, wherein the active region comprises multiple alternating well layers and first barrier layers, wherein each of the first barrier layers has a band gap, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; a first electron blocking layer between the second semiconductor structure and the active region, wherein the first electron blocking layer having a band gap greater than the band gap of one of the first barrier layers; a first aluminum-containing layer between the first electron blocking layer and the active region, wherein the first aluminum-containing layer has a first thickness and a band gap greater than the band gap of the first electron blocking layer; and a second aluminum-containing layer on a side of the first electron blocking layer opposite to the first aluminum-containing layer, wherein the second aluminum-containing layer has a second thickness and a band gap greater than the band gap of the first electron blocking layer; and wherein a ratio of the second thickness of the second aluminum-containing layer to the first thickness of the first aluminum-containing layer is between 0.8 and 1.2.

公开(公告)号：US20210226094A1

公开(公告)日：2021-07-22

申请号：US17221563

申请日：2021-04-02

Applicant: EPISTAR CORPORATION

Inventor： Chia-Ming LIU ,  Chang-Hua HSIEH ,  Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L33/26 ,  H01L33/14 ,  H01L33/20 ,  H01L33/06 ,  H01L33/04 ,  H01L33/30 ,  H01L33/32

Abstract: A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.

公开(公告)号：US20230275022A1

公开(公告)日：2023-08-31

申请号：US18144000

申请日：2023-05-05

Applicant: EPISTAR CORPORATION

Inventor： Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L23/532 ,  H01L21/02 ,  H01L21/285 ,  H01L33/32 ,  H01L33/04 ,  H01L33/14 ,  H01L33/06

CPC classification number: H01L23/53223 ,  H01L21/02579 ,  H01L21/28575 ,  H01L21/0254 ,  H01L33/32 ,  H01L21/02458 ,  H01L33/04 ,  H01L33/145 ,  H01L33/06 ,  H01L31/03046

Abstract: A semiconductor device includes: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region between the first semiconductor structure and the second semiconductor structure, wherein the active region comprises a well layer and a barrier layer, wherein the barrier layer has a band gap; a first electron blocking layer between the second semiconductor structure and the active region, wherein the first electron blocking layer comprises a band gap which is greater than the band gap of the barrier layer; a first aluminum-containing layer between the first electron blocking layer and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; a confinement layer between the first aluminum-containing layer and the active region; and a second aluminum-containing layer between the second semiconductor structure and the first electron blocking layer; wherein both the first aluminum-containing layer and the second aluminum-containing layer have bandgaps greater than the band gap of the first electron blocking layer; and wherein a distance between the first aluminum-containing layer and an upper surface of the active region is between 3 nm and 20 nm.

公开(公告)号：US20190341524A1

公开(公告)日：2019-11-07

申请号：US16513264

申请日：2019-07-16

Applicant: EPISTAR CORPORATION

Inventor： Chia-Ming LIU ,  Chang-Hua HSIEH ,  Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L33/26 ,  H01L33/20 ,  H01L33/14

Abstract: A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.

公开(公告)号：US20180211919A1

公开(公告)日：2018-07-26

申请号：US15875735

申请日：2018-01-19

Applicant: EPISTAR CORPORATION

Inventor： Yung-Chung PAN ,  Chang-Yu TSAI ,  Ching-Chung HU ,  Ming-Pao CHEN ,  Chi SHEN ,  Wei-Chieh LIEN

IPC: H01L23/532 ,  H01L21/02 ,  H01L21/285 ,  H01L33/28 ,  H01L33/12 ,  H01L21/768 ,  H01L31/0304 ,  H01L33/32 ,  H01L29/205

CPC classification number: H01L23/53223 ,  H01L21/02458 ,  H01L21/0254 ,  H01L21/02579 ,  H01L21/28575 ,  H01L21/76846 ,  H01L29/205 ,  H01L31/03042 ,  H01L31/03046 ,  H01L33/04 ,  H01L33/12 ,  H01L33/28 ,  H01L33/32

Abstract: A semiconductor device comprises: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region, wherein the active region comprises multiple alternating well layers and barrier layers, the active region further comprises an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the first electron blocking layer; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies at a distance of between 15 nm and 60 nm from the upper surface of the active region.