公开(公告)号：FR2817267A1

公开(公告)日：2002-05-31

申请号：FR0015334

申请日：2000-11-28

Applicant: ESSILOR INT

Inventor： HELMSTETTER YVON ,  BERNHARD JEAN DANIEL ,  ARROUY FREDERIC

IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  C23C14/08

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 DEG C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

公开(公告)号：FR2817267B1

公开(公告)日：2003-08-29

申请号：FR0015334

申请日：2000-11-28

Applicant: ESSILOR INT

Inventor： HELMSTETTER YVON ,  BERNHARD JEAN DANIEL ,  ARROUY FREDERIC

IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  C23C14/08

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.