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公开(公告)号：DE60132914T2
公开(公告)日：2009-03-12
申请号：DE60132914
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：AT386830T
公开(公告)日：2008-03-15
申请号：AT01998671
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：AU2002222043B2
公开(公告)日：2006-10-12
申请号：AU2002222043
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： ARROUY FREDERIC , HELMSTETTER YVON , BERNHARD JEAN-DANIEL
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：BR0115898A
公开(公告)日：2003-11-04
申请号：BR0115898
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：CA2429150A1
公开(公告)日：2002-06-06
申请号：CA2429150
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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Patent Agency Ranking
公开(公告)号：CA2429150C
公开(公告)日：2010-03-30
申请号：CA2429150
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：ES2301578T3
公开(公告)日：2008-07-01
申请号：ES01998671
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: Procedimiento de fabricación de un apilamiento antirreflejos por evaporación a vacío en un sustrato orgánico (1) a una temperatura inferior a 150ºC, que comporta las etapas de: - depósito de al menos una capa de material de índice de refracción diferente del MgF2 (4, 4''); - preparación de la superficie del sustrato así revestido; y - depósito de una capa exterior de MgF2 (5) sin asistencia iónica.
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公开(公告)号：PT1339893E
公开(公告)日：2008-05-13
申请号：PT01998671
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
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公开(公告)号：DE60132914D1
公开(公告)日：2008-04-03
申请号：DE60132914
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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公开(公告)号：AU2204302A
公开(公告)日：2002-06-11
申请号：AU2204302
申请日：2001-11-26
Applicant: ESSILOR INT
Inventor： HELMSTETTER YVON , BERNHARD JEAN-DANIEL , ARROUY FREDERIC
Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.
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