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公开(公告)号：US07907347B2
公开(公告)日：2011-03-15
申请号：US11816981
申请日：2006-02-22
Applicant: Eric Eva , Wilfried Clauss
Inventor： Eric Eva , Wilfried Clauss
CPC classification number: C03C14/006 , C03C2214/16 , C03C2214/30 , G03F7/70958
Abstract: An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorphous material (6) and the nanoparticles (7) are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective (2) with at least one optical element (3) which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.
Abstract translation: 光学复合材料包括具有第一折射率（na）的非晶态光学材料（6），其中嵌入具有第二较高折射率（nn）的结晶纳米颗粒（7），其中所述非晶材料（6）和 纳米粒子（7）耐UV辐射。 微光刻投影曝光装置包括具有至少一个光学元件（3）的投影物镜（2），该至少一个光学元件特别地在透射中操作并由这种类型的光学复合材料组成。 在制造光学复合材料的方法中，在烟炱或直接工艺中的火焰沉积期间，将结晶纳米颗粒引入到非晶态光学材料中。
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公开(公告)号：US20050179996A1
公开(公告)日：2005-08-18
申请号：US10998050
申请日：2004-11-29
Applicant: Bernhard Weigl , Hans-Jochen Paul , Eric Eva
Inventor： Bernhard Weigl , Hans-Jochen Paul , Eric Eva
CPC classification number: G02B5/208
Abstract: An attenuating filter provides a prescribed attenuation of the intensity of transmitted, short-wavelength, ultraviolet light, in particular, at wavelengths below 200 nm, that is governed by a predefinable spatial distribution of its spectral transmittance. The filter has a transparent substrate (3), e.g. fabricated from crystalline calcium fluoride. A filter coating (5) fabricated from a dielectric material that absorbs over a predefined wavelength range is applied to at least one surface (4) of the substrate. In the case of operating wavelengths of about 193 nm, the filter coating consists largely of tantalum pentoxide. Filters of the type, which may be inexpensively fabricated with high yields, are noted for their high abilities to withstand laser radiation and may be effectively antireflection coated employing simply designed antireflection coatings.
Abstract translation: 衰减滤波器提供了发射的，短波长的紫外光的强度的规定衰减，特别是在200nm以下的波长处，其受其光谱透射率的预定义空间分布的约束。 滤光器具有透明基板（3），例如 由结晶氟化钙制成。 由吸收预定波长范围的介电材料制成的过滤器涂层（5）被施加到衬底的至少一个表面（4）。 在工作波长约193nm的情况下，过滤器涂层主要由五氧化二钽组成。 由于它们能承受激光辐射的高能力并且可以使用简单设计的抗反射涂层可以有效地防反射，因此注意到可以以高产率廉价地制造的类型的过滤器。
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公开(公告)号：US08780448B2
公开(公告)日：2014-07-15
申请号：US13465662
申请日：2012-05-07
Applicant: Eric Eva
Inventor： Eric Eva
CPC classification number: G02B3/06 , G02B1/02 , G02B1/08 , G03F7/70341
Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a′) is produced, wherein before the lens elements (5a, 5a′) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
Abstract translation: 用于从回火坯料（1）制造优选不对称透镜元件（5a）的方法的特征在于：从回火坯料（1）的第一部分体积（1a）制备透镜元件（5a），其厚度d 小于回火坯料（1）的厚度D的约70％，优选小于约60％，特别优选小于约50％。 优选地，从回火坯料（1）的第二部分体积（1b）产生至少另一透镜元件（5a'），其中在制造透镜元件（5a，5a'）之前，回火坯料（1）是 分为第一和第二部分体积（1a，1b）。
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公开(公告)号：US07791811B2
公开(公告)日：2010-09-07
申请号：US11775991
申请日：2007-07-11
Applicant: Eric Eva
Inventor： Eric Eva
IPC: G02B3/00
CPC classification number: G02B3/06 , G02B1/02 , G02B1/08 , G03F7/70341
Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a′) is produced, wherein before the lens elements (5a, 5a′) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
Abstract translation: 用于从回火坯料（1）制造优选不对称透镜元件（5a）的方法的特征在于：从回火坯料（1）的第一部分体积（1a）制备透镜元件（5a），其厚度d 小于回火坯料（1）的厚度D的约70％，优选小于约60％，特别优选小于约50％。 优选地，从回火坯料（1）的第二部分体积（1b）产生至少另一透镜元件（5a'），其中在制造透镜元件（5a，5a'）之前，回火坯料（1）是 分为第一和第二部分体积（1a，1b）。
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5.发明授权Method and apparatus for setting optical imaging properties by means of radiation treatment 有权通过辐射处理设置光学成像性能的方法和装置公开(公告)号：US07352452B2
公开(公告)日：2008-04-01
申请号：US11228286
申请日：2005-09-19
Applicant: Ulrich Wegmann , Eric Eva
Inventor： Ulrich Wegmann , Eric Eva
IPC: G01B9/00
CPC classification number: G01J9/00 , G02B27/0025 , G03F7/70308 , G03F7/706
Abstract: Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state, and a method for setting the imaging properties of an internal optical element with radiation treatment. A measurement is carried out on the optical system in order to determine one or more aberrations in a spatially resolved fashion, a correction that changes the shape and/or refractive index of the internal optical element is calculated in order to reduce the measured aberration or aberrations, and the optical element is irradiated with the aid of a processing radiation that changes the shape and/or refractive index, in accordance with the calculated correction. In addition, a radiation treatment of an optical element for setting its imaging properties uses a compacting processing radiation with the aid of which the optical element is irradiated in a controlled fashion in such a way that its imaging properties are influenced in a controlled fashion via spatially resolved material shrinkage and/or increase of the refractive index. The method and apparatus are suited, for example, for producing correction aspherics in microlithography projection objectives in the installed state.
Abstract translation: 具体地说，一种使用放射线治疗来设定光学成像特性的方法和装置，具体地说，一种用于在安装状态下设置光学系统的至少一个光学元件的放射线处理光学系统的成像特性的方法和装置，以及一种设置方法 具有放射线处理的内部光学元件的成像特性。 在光学系统上进行测量以便以空间分辨的方式确定一个或多个像差，计算改变内部光学元件的形状和/或折射率的校正，以便减少所测量的像差或像差 并且借助于根据所计算的校正改变形状和/或折射率的处理辐射照射光学元件。 此外，用于设置其成像特性的光学元件的辐射处理使用压实处理辐射，借助于该光学元件以受控的方式照射光学元件，使得其成像特性以受控的方式经由空间影响 分辨的材料收缩和/或折射率的增加。 该方法和装置例如适用于在安装状态下在微光刻投影物镜中产生校正非球面。
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Patent Agency Ranking
公开(公告)号：US06996141B1
公开(公告)日：2006-02-07
申请号：US09588261
申请日：2000-06-06
Applicant: Karl-Heinz Schuster , Harry Bauer , Eric Eva
Inventor： Karl-Heinz Schuster , Harry Bauer , Eric Eva
IPC: H01S3/13
CPC classification number: G03F7/7055 , G02B27/106 , G02B27/144 , G02B27/145 , G03F7/2008
Abstract: In a device for reducing the peak power of a pulsed laser light source, in particular for a projection exposure system, there is arranged in the beam path (1) at least one beam splitter apparatus (3, 4) by means of which a detour line (5 or 11) is produced, via reflecting components (6, 7, 8 or 12, 13, 14) for at least one partial beam (1b) with subsequent recombination at a beam recombining element (9 or 15) with the other partial beam or beams (1b or 10b) to form a total beam.
Abstract translation: 在用于降低脉冲激光光源的峰值功率的装置中，特别是对于投影曝光系统，在光束路径（1）中布置有至少一个分束器装置（3,4），通过该光束分离器设备绕行 通过用于至少一个部分光束（1b）的反射分量（6,7,8或12,13,14）产生线（5或11），随后在光束重组元件（9或15）处与 其他部分光束或光束（1b或10b）以形成总光束。
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7.发明授权Method of making a fracture-resistant calcium fluoride single crystal and its use 失效耐断裂氟化钙单晶的制备方法及其应用公开(公告)号：US06740159B2
公开(公告)日：2004-05-25
申请号：US10230232
申请日：2002-08-28
Applicant: Joerg Kandler , Ewald Moersen , Burkhard Speit , Harry Bauer , Thure Boehm , Eric Eva , Michael Thier , Hexin Wang , Frank Richter , Hans-Josef Paus
Inventor： Joerg Kandler , Ewald Moersen , Burkhard Speit , Harry Bauer , Thure Boehm , Eric Eva , Michael Thier , Hexin Wang , Frank Richter , Hans-Josef Paus
IPC: C30B15804
Abstract: A method of making a fracture-resistant large-size calcium fluoride single crystal is described, which is suitable for an optical component for radiation in the far UV range. The calcium fluoride raw material for the single crystal is first melted and subsequently solidified by cooling the melt to form a single crystal. However the calcium fluoride raw material is doped with from 1 to 250, preferably 1 to 100, ppm of strontium, preferably added as strontium fluoride, and contains from 1 to 10 ppm of sodium as well as up to 100 ppm of other impurities.
Abstract translation: 描述了制造耐断裂大尺寸氟化钙单晶的方法，其适用于在远紫外范围内用于辐射的光学部件。 首先将用于单晶的氟化钙原料熔化并随后通过冷却熔体而固化形成单晶。 然而，氟化钙原料掺杂有1至250，优选1至100ppm的锶，优选以氟化锶加入，并且含有1至10ppm的钠以及至多100ppm的其它杂质。
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公开(公告)号：US08508854B2
公开(公告)日：2013-08-13
申请号：US12966552
申请日：2010-12-13
Applicant: Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
Inventor： Eric Eva , Payam Tayebati , Michael Thier , Markus Hauf , Ulrich Schoenhoff , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner
IPC: G02B9/00
CPC classification number: G03F7/70891 , G02B7/028 , G02B27/0068 , G03F7/70266
Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
Abstract translation: 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。
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公开(公告)号：US08174771B2
公开(公告)日：2012-05-08
申请号：US12851073
申请日：2010-08-05
Applicant: Eric Eva
Inventor： Eric Eva
CPC classification number: G02B3/06 , G02B1/02 , G02B1/08 , G03F7/70341
Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a′) is produced, wherein before the lens elements (5a, 5a′) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).
Abstract translation: 用于从回火坯料（1）制造优选不对称透镜元件（5a）的方法的特征在于：从回火坯料（1）的第一部分体积（1a）制备透镜元件（5a），其厚度d 小于回火坯料（1）的厚度D的约70％，优选小于约60％，特别优选小于约50％。 优选地，从回火坯料（1）的第二部分体积（1b）产生至少另一透镜元件（5a'），其中在制造透镜元件（5a，5a'）之前，回火坯料（1）是 分为第一和第二部分体积（1a，1b）。
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公开(公告)号：US20090036289A1
公开(公告)日：2009-02-05
申请号：US11816981
申请日：2006-02-22
Applicant: Eric Eva , Wilfried Clauss
Inventor： Eric Eva , Wilfried Clauss
CPC classification number: C03C14/006 , C03C2214/16 , C03C2214/30 , G03F7/70958
Abstract: An optical composite material comprises an amorphous optical material (6) with a first refractive index (na), into which crystalline nanoparticles (7) having a second, higher refractive index (nn) are embedded, wherein the amorphous material (6) and the nanoparticles (7) are resistant to UV radiation. A microlithography projection exposure apparatus comprises a projection objective (2) with at least one optical element (3) which is, in particular, operated in transmission and consists of an optical composite material of this type. In a method for producing the optical composite material, crystalline nanoparticles are introduced into the amorphous optical material during flame deposition in a soot or direct process.
Abstract translation: 光学复合材料包括具有第一折射率（na）的非晶态光学材料（6），其中嵌入具有第二较高折射率（nn）的结晶纳米颗粒（7），其中所述非晶材料（6）和 纳米粒子（7）耐UV辐射。 微光刻投影曝光装置包括具有至少一个光学元件（3）的投影物镜（2），该至少一个光学元件特别地在透射中操作并由这种类型的光学复合材料组成。 在制造光学复合材料的方法中，在烟炱或直接工艺中的火焰沉积期间，将结晶纳米颗粒引入到非晶态光学材料中。
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