公开(公告)号：EP4199030A1

公开(公告)日：2023-06-21

申请号：EP21214852.2

申请日：2021-12-15

Applicant: FEI Company

Inventor： van Leeuwen, Hugo ,  Verschueren, Edwin ,  Lamers, Ronald ,  van den Oetelaar, Twan ,  Verheijen, Martin ,  van Wensveen, Marcel

IPC: H01J37/22 ,  H01J37/20

Abstract: The present invention relates to a method to reduce drift of a sample and/or its image in a microscopy system, wherein the method comprises determining an expected thermal drift of the sample, and compensating for the drift of the sample and/or its image based upon the expected thermal drift. The present invention also relates to a corresponding microscopy system and a computer program product to perform the method according to the present invention.