公开(公告)号：AT504075T

公开(公告)日：2011-04-15

申请号：AT05710327

申请日：2005-02-17

Applicant: FERROTEC CORP ,  TAKIKAWA HIROFUMI

Inventor： TAKIKAWA HIROFUMI ,  SHIINA YUICHI

IPC: H01J37/32 ,  C23C14/24 ,  C23C14/32 ,  H05H1/50

Abstract: A plasma generator capable of performing intermittent operation of repeating a sequence operation including start, sustaining, and stop of a cathode arc plasma for a long time. The plasma generator for forming a thin film comprises a cathode (4) for supplying constituent particles of an arc plasma and a trigger-and-anode (6) for starting and sustaining the arc plasma. The cathode surface (4a) of the cathode (4) is flat or finely irregular, and the anode surface (6c) of the trigger-and-anode (6) brought into contact with the cathode surface (4a) is flat. The anode surface (6c) is so arranged as to be brought into contact with the whole cathode surface (4a) when a plasma is started. The contact point between a fine projection end (4b) of the cathode surface (4a) and the anode surface (6c) is made a plasma emission point. When the projection is consumed by plasma emission, another projection end which can be brought into contact with the anode surface (6c) is used as another plasma emission point, thus enabling intermittent operation of persistently repeating the sequence operation. Consequently, a stable plasma can be produced for a long time.

公开(公告)号：SG176927A1

公开(公告)日：2012-01-30

申请号：SG2011094323

申请日：2010-05-06

Applicant: FERROTEC CORP

Inventor： SHIINA YUICHI ,  WATANABE IWAO

Abstract: >MULTIPLY DIVIDED ANODE WALL TYPE PLASMA GENERATION APPARATUS AND PLASMA PROCESSING APPARATUSAn object of the present invention is to provide a multiply divided anode wall type plasma generation apparatus, wherein a short circuit between the cathode and the anode is not caused even if deposited matter adhering and depositing on the inner wall of the anode by diffusion plasma detach and fall. Also, an object is to provide a plasma processing apparatus using the same.When the plasma (P) generated between the cathode (2) and the anode (3) is ejected forward from the cathode (2) and diffuses, the diffusing material (41) recrystalizes, adheres, and deposits on the inner wall of an electrode cylindrical body, and detaches and falls as a carbon flake (40). The inner wall of the electrode cylindrical body is multiply divided in the shape of a matrix by means of longitudinal and lateral grooves (37, 38). Even if the diffusing plasma adheres and deposits on the anode (3), the size of the deposited matter is reduced by the deposited matter separation effect by a large number of protruding portions (35), and no large or elongated deposited matter is produced. Carbon flakes (40) detach and fall as minute pieces from the protruding portions (39) which are of small size, none of the deposited matter that have detached and fallen extends over and bridges the cathode (2) and the anode (3), and thus a short circuit between both electrodes is prevented.Figure 3

公开(公告)号：AT555230T

公开(公告)日：2012-05-15

申请号：AT06729952

申请日：2006-03-24

Applicant: FERROTEC CORP

Inventor： SHIINA YUICHI

IPC: C23C14/32

公开(公告)号：DE602005027184D1

公开(公告)日：2011-05-12

申请号：DE602005027184

申请日：2005-02-17

Applicant: FERROTEC CORP ,  TAKIKAWA HIROFUMI

Inventor： TAKIKAWA HIROFUMI ,  SHIINA YUICHI

IPC: H05H1/50 ,  C23C14/24 ,  C23C14/32 ,  H01J37/32

公开(公告)号：JP2011012306A

公开(公告)日：2011-01-20

申请号：JP2009157103

申请日：2009-07-01

Applicant: Ferrotec Corp ,  株式会社フェローテック

Inventor： SHIINA YUICHI ,  WATANABE GEN

IPC: C23C14/32 ,  H05H1/48

CPC classification number: C23C14/564 ,  C23C14/325 ,  H01J37/32357 ,  H01J37/32477

Abstract: PROBLEM TO BE SOLVED: To prevent plasma flow-derived deposits depositsed on an annular rib for droplet capture in a plasma processing device from falling in a plasma generation unit and causing a short circuit.SOLUTION: The annular rib 40 for the droplet capture is divided into a plurality of rib pieces. Thus, from the beginning of the depositsion of the deposits 90 on the annular rib due to the aggregation of plasma-flow substances, it is possible to mince the deposits. By mincing the deposits, when the deposits fall in a plasma generation unit 10 as a broken piece 91, the broken piece gets into a groove portion 14 provided between a cathode 11 and a wall surface 13 of the plasma generation unit, thereby preventing any electrical short circuit between the cathode and the wall surface.

Abstract translation: 要解决的问题：为了防止等离子体流产生的沉积物沉积在等离子体处理装置中的用于液滴捕获的环形肋上落入等离子体产生单元中并导致短路。解决方案：用于液滴捕获的环形肋40被分割 形成多个肋片。 因此，由于等离子体流动物质的聚集，由于沉积物90在环形肋上的沉积开始，因此可能会破坏沉积物。 通过切碎沉积物，当沉积物作为破碎件91落在等离子体产生单元10中时，破碎件进入设置在等离子体发生单元的阴极11和壁表面13之间的槽部14中，从而防止任何电 阴极和墙壁之间的短路。

公开(公告)号：SG177373A1

公开(公告)日：2012-02-28

申请号：SG2011096344

申请日：2010-06-30

Applicant: FERROTEC CORP

Inventor： SHIINA YUICHI ,  WATANABE IWAO

Abstract: DIVIDED ANNULAR RIB TYPE PLASMA PROCESSING APPARATUS>A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a short circuit. The annular rib for the droplet capture is divided into multiple rib segments. Thus, from the beginning of the formation of the deposited matter on the annular rib due to the aggregation of the material in the plasma stream, it is possible to reduce the size of the deposited matter. By reducing the size of this deposited matter, when a piece of the deposited matter falls into the plasma generation portion, the piece of the deposited matter gets into a groove portion provided between a cathode and a wall surface of the plasma generation portion, thereby preventing the electrical short circuit between the cathode and the wall surface.FIG. 2

公开(公告)号：EP2415897A4

公开(公告)日：2015-10-21

申请号：EP10758321

申请日：2010-02-10

Applicant: FERROTEC CORP

Inventor： SHIINA YUICHI

IPC: C23C14/24 ,  C23C14/32 ,  H01J37/32 ,  H05H1/48

CPC classification number: H01J37/32422 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32376 ,  H01J37/32669 ,  H01J37/32871

公开(公告)号：JP2009235500A

公开(公告)日：2009-10-15

申请号：JP2008083750

申请日：2008-03-27

Applicant: Ferrotec Corp ,  株式会社フェローテック

Inventor： SHIINA YUICHI

IPC: C23C14/32

CPC classification number: H01J37/32366 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32357 ,  H05H1/50

Abstract: PROBLEM TO BE SOLVED: To provide a plasma generating apparatus by which a droplet mixed in plasma can be efficiently removed and surface processing accuracy can be improved in film formation wherein high purity plasma is used, and also to provide a plasma processing apparatus using such plasma generating apparatus. SOLUTION: A droplet removing section arranged in a plasma traveling part is composed of: a straight plasma travelling pipe P0 connected to a plasma generating section A; a first plasma travelling pipe P1 connected to the straight plasma travelling pipe P0 by being bent; a second plasma travelling pipe P2 connected to an end of the first plasma travelling pipe P1 by being diagonally arranged at a prescribed flexion angle with respect to the pipe axis of the first plasma travelling pipe; and a third plasma travelling pipe P3, which is connected to an end of the second plasma travelling pipe P2 by being bent and discharges plasma from a plasma discharge port. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：提供一种能够有效地除去混合在等离子体中的液滴的等离子体产生装置，并且可以提高使用高纯度等离子体的成膜中的表面处理精度，并且还提供等离子体处理装置 使用这种等离子体产生装置。 解决方案：布置在等离子体行进部分中的液滴除去部分包括：连接到等离子体产生部分A的直的等离子体行进管P0; 通过弯曲连接到直等离子体行进管P0的第一等离子体行进管P1; 通过相对于第一等离子体行进管的管轴以规定的弯曲角度对角地配置而连接到第一等离子体行进管P1的端部的第二等离子体行进管P2; 以及第三等离子体行进管P3，其通过弯曲等离子体等离子体连接到第二等离子体行进管P2的端部。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：EP2068602A4

公开(公告)日：2009-11-25

申请号：EP07828523

申请日：2007-09-27

Applicant: FERROTEC CORP

Inventor： SHIINA YUICHI

IPC: H05H1/24 ,  C23C14/24 ,  C23C14/32

CPC classification number: H01J37/32357 ,  C23C14/325 ,  H01J37/32055

公开(公告)号：JP2011012307A

公开(公告)日：2011-01-20

申请号：JP2009157158

申请日：2009-07-01

Applicant: Ferrotec Corp ,  株式会社フェローテック

Inventor： SHIINA YUICHI ,  WATANABE GEN

IPC: C23C14/24 ,  C23C14/06 ,  H01L21/31 ,  H05H1/48

CPC classification number: H01J37/3255 ,  C23C14/0605 ,  C23C14/325 ,  C23C14/564 ,  H01J37/32357 ,  H01J37/32467 ,  H01J37/32477

Abstract: PROBLEM TO BE SOLVED: To provide a multi-split anode wall plasma generating device capable of preventing the short circuit between a cathode and an anode by the peeling off of deposits adhering to and depositing on an inner wall of the anode by diffusion plasma, and to provide a plasma treating device using the same.SOLUTION: When plasma P generated between a cathode 2 and an anode 3 is discharged forward from the cathode 2 and diffused, the diffusing substance 41 is re-crystallized, adhered to and deposited on the inner wall of an electrode cylinder, and peels off as carbon flakes 40. The inner wall of the electrode cylinder is multi-split in a matrix by means of longitudinal and lateral grooves 37, 38. Even if the diffusing plasma is adhered to and deposited on the anode 3, the deposits are very small due to the deposit separation action of a number of projections 35, and no large or long deposits are produced. Carbon flakes 40 peel off as small pieces from the projections 39 which are of small size, none of the deposits which have peeled off bridges across the cathode 2 and the anode 3, and thus any short circuit phenomenon between both electrodes is prevented.

Abstract translation: 要解决的问题：提供一种多分离阳极壁等离子体发生装置，其能够通过扩散等离子体剥离附着在阳极的内壁上的沉积物的剥离来防止阴极与阳极之间的短路，以及 提供使用其的等离子体处理装置。解决方案：当阴极2和阳极3之间产生的等离子体P从阴极2向前排出并扩散时，扩散物质41再结晶，粘附并沉积在内部 电极圆柱体的壁，并且作为碳薄片40剥离。电极圆柱体的内壁通过纵向和横向凹槽37,38以矩阵形式多分割。即使扩散等离子体粘附并沉积在 阳极3，由于多个突起35的沉积分离作用，沉积物非常小，并且不产生大的或长的沉积物。 碳片40从小尺寸的突起39剥离为小块，没有沉积物穿过阴极2和阳极3剥离桥，从而防止了两个电极之间的任何短路现象。