公开(公告)号：HK1219341A1

公开(公告)日：2017-03-31

申请号：HK16107200

申请日：2016-06-21

Applicant: FRANWELL INC

Inventor： DAGDELEN UYSAL DILEK ,  WELLS JEFFREY LANE ,  HOLCOMB EDWARD

IPC: G09G20060101

公开(公告)号：EP2973531A4

公开(公告)日：2016-10-26

申请号：EP14763213

申请日：2014-03-17

Applicant: FRANWELL INC

Inventor： DAGDELEN UYSAL DILEK ,  WELLS JEFFREY LANE ,  HOLCOMB EDWARD

IPC: G02F1/167 ,  G09F3/02 ,  G09F3/20

CPC classification number: G02F1/167 ,  G02F1/13452 ,  G02F2001/1676

Abstract: Embodiments of the present invention relate to a mass resolving aperture that may be used in an ion implantation system. Embodiments of the present invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the present invention also relate to the filtering of a flow of charged particles through a closed plasma channel (“CPC”) superconductor, or boson energy transmission system.