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公开(公告)号：DE4304846A1
公开(公告)日：1994-08-18
申请号：DE4304846
申请日：1993-02-17
Applicant: FRAUNHOFER GES FORSCHUNG
Inventor： KOZLOWSKI FRANK DIPL PHYS , STEINER PETER DIPL PHYS , LANG WALTER DR ING , SAUTER MARTIN DIPL PHYS , RICHTER AXEL DR ING
IPC: H01L33/34 , H05H1/00 , H05H1/24 , H01J63/08 , H01L21/306
Abstract: A plasma is produced by applying a voltage to points, which are separated from one another, of a microporous body. This can be done, for example, by applying a voltage of between 50 and 100 V across a microporous layer of a silicon wafer.
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