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公开(公告)号：DE60221062T2
公开(公告)日：2008-03-20
申请号：DE60221062
申请日：2002-04-11
Applicant: FUJIFILM CORP
Inventor： KAWAUCHI IKUO , ENDO TADASHI , TOKUNAGA HIROJI
Abstract: A support for a lithographic printing plate, wherein scum resistance is improved when processed into a lithographic printing plate by performing treatment for water wettablity and, in addition, press life is excellent. A support for a lithographic printing plate, which is obtained by performing at least anodizing treatment and silicate treatment on an aluminum plate, wherein a ratio of the number of atoms of alkali-earth metal and silicon existing on a surface thereof is 0.1 to 0.95.
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公开(公告)号：AT541709T
公开(公告)日：2012-02-15
申请号：AT02022278
申请日：2002-10-07
Applicant: FUJIFILM CORP
Inventor： HOTTA YOSHINORI , HOTTA HISASHI , ENDO TADASHI
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公开(公告)号：DE60311907T2
公开(公告)日：2007-10-31
申请号：DE60311907
申请日：2003-04-02
Applicant: FUJIFILM CORP
Inventor： MUROTA YASUBUMI , HOTTA YOSHINORI , ENDO TADASHI
Abstract: A presensitized plate useful for making a lithographic printing plates comprises an aluminum substrate provided thereon with a photopolymerizable light-sensitive layer, wherein the light-sensitive layer comprises an ethylenically unsaturated bond-containing compound having at least three methacryloyl or acryloyl groups alone or in any combination in the molecule and the substrate is Substrate A, which has, on the surface, grained structures comprising medium waved structure whose average pore size ranges from 0.5. to 5µm and small waved structure whose average pore size ranges from 0.01 to 0.2µm, which are superimposed; or Substrate B, which has, on the surface, grained structures comprising large waved structure whose average wavelength ranges from 5 to 100µm, medium waved structure whose average pore size ranges from 0.5 to 5µm and small waved structure whose average pore size ranges from 0.01 to 0.2µm, which are superimposed. The presensitized plate permits the maintenance of the balance between the resistance to contamination and the printing durability of the resulting lithographic printing plate to a substantially high level, when forming a light-sensitive layer containing a methacryl or acryl compound having at least three functional groups on the substrate according to the present invention having a characteristic surface grained pattern.
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Patent Agency Ranking
公开(公告)号：DE60221062D1
公开(公告)日：2007-08-23
申请号：DE60221062
申请日：2002-04-11
Applicant: FUJIFILM CORP
Inventor： KAWAUCHI IKUO , ENDO TADASHI , TOKUNAGA HIROJI
Abstract: A support for a lithographic printing plate, wherein scum resistance is improved when processed into a lithographic printing plate by performing treatment for water wettablity and, in addition, press life is excellent. A support for a lithographic printing plate, which is obtained by performing at least anodizing treatment and silicate treatment on an aluminum plate, wherein a ratio of the number of atoms of alkali-earth metal and silicon existing on a surface thereof is 0.1 to 0.95.
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公开(公告)号：AT358596T
公开(公告)日：2007-04-15
申请号：AT01976845
申请日：2001-10-26
Applicant: FUJIFILM CORP
Inventor： ENDO TADASHI , HOTTA HISASHI , TERAOKA KATSUYUKI , MIWA HIDEKI , YASUTAKE TERUYOSHI
Abstract: Objects of the present invention are to provide a positive working presensitized plate of a thermal type, which has damage resistance, and which is handled easily in conventional operation, high in sensitivity and excellent in press life when used as a lithographic printing plate, and to provide a support for a lithographic printing plate, which is suitably used for the same. The objects have been achieved by a support for a lithographic printing plate obtained by performing graining treatment, alkali etching treatment and anodizing treatment on an aluminum plate, wherein a ratio of a real area of a surface thereof to an apparent area of the surface set larger by 1.3 to 1.8 times, comprising a pit having an average diameter of 0.3 to 1.0 mu m and a micro grained structure inside on the surface, wherein a ratio of an apparent area of the pits to the apparent area of the surface is 90 % or more; and a presensitized plate comprising the support for a lithographic printing plate and a photosensitive layer that can become alkali-soluble by heating provided on the support.
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公开(公告)号：DE60127658D1
公开(公告)日：2007-05-16
申请号：DE60127658
申请日：2001-10-26
Applicant: FUJIFILM CORP
Inventor： ENDO TADASHI , HOTTA HISASHI , TERAOKA KATSUYUKI , MIWA HIDEKI , YASUTAKE TERUYOSHI
Abstract: Objects of the present invention are to provide a positive working presensitized plate of a thermal type, which has damage resistance, and which is handled easily in conventional operation, high in sensitivity and excellent in press life when used as a lithographic printing plate, and to provide a support for a lithographic printing plate, which is suitably used for the same. The objects have been achieved by a support for a lithographic printing plate obtained by performing graining treatment, alkali etching treatment and anodizing treatment on an aluminum plate, wherein a ratio of a real area of a surface thereof to an apparent area of the surface set larger by 1.3 to 1.8 times, comprising a pit having an average diameter of 0.3 to 1.0 mu m and a micro grained structure inside on the surface, wherein a ratio of an apparent area of the pits to the apparent area of the surface is 90 % or more; and a presensitized plate comprising the support for a lithographic printing plate and a photosensitive layer that can become alkali-soluble by heating provided on the support.
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公开(公告)号：DE60127658T2
公开(公告)日：2007-12-20
申请号：DE60127658
申请日：2001-10-26
Applicant: FUJIFILM CORP
Inventor： ENDO TADASHI , HOTTA HISASHI , TERAOKA KATSUYUKI , MIWA HIDEKI , YASUTAKE TERUYOSHI
Abstract: Objects of the present invention are to provide a positive working presensitized plate of a thermal type, which has damage resistance, and which is handled easily in conventional operation, high in sensitivity and excellent in press life when used as a lithographic printing plate, and to provide a support for a lithographic printing plate, which is suitably used for the same. The objects have been achieved by a support for a lithographic printing plate obtained by performing graining treatment, alkali etching treatment and anodizing treatment on an aluminum plate, wherein a ratio of a real area of a surface thereof to an apparent area of the surface set larger by 1.3 to 1.8 times, comprising a pit having an average diameter of 0.3 to 1.0 mu m and a micro grained structure inside on the surface, wherein a ratio of an apparent area of the pits to the apparent area of the surface is 90 % or more; and a presensitized plate comprising the support for a lithographic printing plate and a photosensitive layer that can become alkali-soluble by heating provided on the support.
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公开(公告)号：AT366671T
公开(公告)日：2007-08-15
申请号：AT02008121
申请日：2002-04-11
Applicant: FUJIFILM CORP
Inventor： KAWAUCHI IKUO , ENDO TADASHI , TOKUNAGA HIROJI
Abstract: A support for a lithographic printing plate, wherein scum resistance is improved when processed into a lithographic printing plate by performing treatment for water wettablity and, in addition, press life is excellent. A support for a lithographic printing plate, which is obtained by performing at least anodizing treatment and silicate treatment on an aluminum plate, wherein a ratio of the number of atoms of alkali-earth metal and silicon existing on a surface thereof is 0.1 to 0.95.
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