2.
    发明专利
    未知

    公开(公告)号:AT460687T

    公开(公告)日:2010-03-15

    申请号:AT01115836

    申请日:2001-06-28

    Applicant: FUJIFILM CORP

    Inventor: KAMITANI KIYOSHI

    Abstract: A method for manufacturing a lithographic printing plate is provided in which conditions for heating a support and a photosensitive coated layer in a drying and heating step can be changed rapidly over a wide range, and the photosensitive coated layer and the support are heated without being contacted.

    4.
    发明专利
    未知

    公开(公告)号:DE60141498D1

    公开(公告)日:2010-04-22

    申请号:DE60141498

    申请日:2001-06-28

    Applicant: FUJIFILM CORP

    Inventor: KAMITANI KIYOSHI

    Abstract: A method for manufacturing a lithographic printing plate is provided in which conditions for heating a support and a photosensitive coated layer in a drying and heating step can be changed rapidly over a wide range, and the photosensitive coated layer and the support are heated without being contacted.

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