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公开(公告)号:DE602006007626D1
公开(公告)日:2009-08-13
申请号:DE602006007626
申请日:2006-02-28
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI , NARUOKA YASUHIKO
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公开(公告)号:AT460687T
公开(公告)日:2010-03-15
申请号:AT01115836
申请日:2001-06-28
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI
Abstract: A method for manufacturing a lithographic printing plate is provided in which conditions for heating a support and a photosensitive coated layer in a drying and heating step can be changed rapidly over a wide range, and the photosensitive coated layer and the support are heated without being contacted.
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公开(公告)号:AT450812T
公开(公告)日:2009-12-15
申请号:AT04022192
申请日:2004-09-17
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI , INUKAI YUZOH , ODA AKIO
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公开(公告)号:DE60141498D1
公开(公告)日:2010-04-22
申请号:DE60141498
申请日:2001-06-28
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI
Abstract: A method for manufacturing a lithographic printing plate is provided in which conditions for heating a support and a photosensitive coated layer in a drying and heating step can be changed rapidly over a wide range, and the photosensitive coated layer and the support are heated without being contacted.
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公开(公告)号:DE602004024359D1
公开(公告)日:2010-01-14
申请号:DE602004024359
申请日:2004-09-17
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI , INUKAI YUZOH , ODA AKIO
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公开(公告)号:DE602006003541D1
公开(公告)日:2008-12-18
申请号:DE602006003541
申请日:2006-02-28
Applicant: FUJIFILM CORP
Inventor: KAMITANI KIYOSHI , NARUOKA YASUHIKO
IPC: B41C1/10
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