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公开(公告)号:KR20180025909A
公开(公告)日:2018-03-09
申请号:KR20187002789
申请日:2016-07-27
Applicant: FUJIFILM CORP
Inventor: KOZAWA YUSUKE , KAWAGUCHI JUNJI , MATSUURA ATSUSHI
CPC classification number: C22C21/00 , C25D11/04 , C25F3/04 , C25F3/14 , H01G11/70 , H01M4/72 , Y02E60/13
Abstract: 활물질과의밀착성및 도포성이높고, 높은강도를갖는알루미늄판및 알루미늄판의제조방법을제공하는것을과제로한다. 복수의관통구멍의평균개구직경이 0.1μm 이상 100μm 이하이고, 복수의관통구멍의평균개구율이 2% 이상 40% 이하이며, 복수의관통구멍중, 개구직경이 5μm 이하인관통구멍의비율이 40% 이하이고, 복수의관통구멍중, 개구직경이 40μm 이상인관통구멍의비율이 40% 이하이며, 복수의관통구멍중, 관통구멍의면적 S과, 관통구멍의장축을직경으로한 원의면적 S의비율 S/S이 0.1 이상 1 이하인관통구멍의비율이 50% 이상이다.
Abstract translation: 本发明的目的是提供一种制造对活性材料具有高粘附性和可应用性并且具有高强度的铝板和铝板的方法。 其中,所述多个通孔的平均直径为0.1μm以上且100μm以下,所述多个通孔的平均开口率为2%〜40%,开口直径为5μm以下的通孔的比例为40% 多个贯通孔中开口直径为40μm以上的贯通孔的比例为40%以下,并且贯通孔的面积S和贯通孔的长径的圆的面积S为直径 S / S比为0.1〜1的贯通孔的比例为50%以上。
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公开(公告)号:DE60329343D1
公开(公告)日:2009-11-05
申请号:DE60329343
申请日:2003-02-26
Applicant: FUJIFILM CORP
Inventor: MATSUURA ATSUSHI , UESUGI AKIO , MIWA HIDEKI , NISHINO ATSUO , SAWADA HIROKAZU
IPC: B41N3/03
Abstract: The present invention provides a method for preparing an aluminum support for lithographic printing plate, the aluminum support for a lithographic printing plate obtained by the method and a presensitized plate using the same, characterized in that anodizing treatment is performed on an aluminum plate after hydrochloric acid electrolytic graining treatment if necessary, nitric acid electrolytic graining treatment are performed on the aluminum plate at a specified ratio of quantities of electricity, and with this method, a lower-purity aluminum plate could be used and a obtained support for a lithographic printing plate is excellent in press life and scum resistance when a lithographic printing plate is prepared.
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公开(公告)号:DE602005008125D1
公开(公告)日:2008-08-28
申请号:DE602005008125
申请日:2005-03-16
Applicant: FUJIFILM CORP
Inventor: MATSUURA ATSUSHI , SAWADA HIROKAZU , UESUGI AKIO
Abstract: Disclosed is a support for a lithographic printing plate which, when measured over a 400 µm x 400 µm surface region thereon using a three-dimensional non-contact roughness tester, has at most 5.0 convex portions of a height from centerline of at least 0.70 µm and an equivalent circle diameter of at least 20 µm, and has at least 800 concave portions of a depth from centerline of at least 0.50 µm and an equivalent circle diameter of at least 2.0 µm. Presensitized plates which are obtainable by using the support for a lithographic printing plate according to the present invention have an excellent scumming resistance and an extremely long press life.
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公开(公告)号:BR112015001857B1
公开(公告)日:2021-09-14
申请号:BR112015001857
申请日:2013-07-26
Applicant: FUJIFILM CORP
Inventor: NISHINO ATSUO , MATSUURA ATSUSHI , SAWADA HIROKAZU , KUROKAWA SHINYA , TAGAWA YOSHIHARU , MIYAGAWA YUYA
Abstract: suporte para chapa de impressão litográfica, e método de produção do mesmo, bem como da chapa de impressão litográfica original o objetivo da presente invenção é fornecer um suporte para uma chapa de impressão litográfica. o suporte tem excelente resistência a riscos e com o suporte, pode ser obtida uma chapa de impressão litográfica original com excelente durabilidade de impressão, quando utilizada como uma chapa de impressão litográfica, e uma excelente capacidade de revelação na prensa. para este suporte para chapa de impressão litográfica, que é fornecido com uma chapa de alumínio e uma película de alumínio anodizada sobre ele, os microporos na película anodizada se estendem na direção de profundidade a partir da superfície, a qual está no lado oposto da chapa de alumínio. os microporos estão configurados a partir de uma seção de furo de grande diâmetro, que se estende da superfície da película anodizada até uma profundidade média de 75 a 120 nm (profundidade (a)), e uma seção de furo de pequeno diâmetro, que se conecta com a parte inferior do furo da seção de furo de grande diâmetro e estende-se da posição de conexão até uma profundidade média de 900 a 2.000 nm. o diâmetro médio da superfície da película anodizada da seção de furo de grande diâmetro é de 10 nm, mas menor do que 30 nm, e o diâmetro médio e a profundidade (a) satisfazem a razão (profundidade (a) / diâmetro médio) = maior do que 4,0 a 12,0; e o diâmetro médio na posição de conexão da seção dos poros de pequeno diâmetro é maior do que 0 e menor do que 10 nm.
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公开(公告)号:DE60132754T2
公开(公告)日:2009-03-05
申请号:DE60132754
申请日:2001-12-20
Applicant: FUJIFILM CORP
Inventor: TOMITA TADABUMI , TERAOKA KATSUYUKI , HOTTA HISASHI , MATSUURA ATSUSHI , UESUGI AKIO
Abstract: A lithographic printing plate precursor is disclosed, comprising a metal support having formed thereon an anodic oxide film, and an image-forming layer containing a light-to-heat converting agent, or a light-sensitive layer capable of image-forming with infrared laser exposure provided in this order from the support.
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公开(公告)号:AT401203T
公开(公告)日:2008-08-15
申请号:AT05005725
申请日:2005-03-16
Applicant: FUJIFILM CORP
Inventor: MATSUURA ATSUSHI , SAWADA HIROKAZU , UESUGI AKIO
Abstract: Disclosed is a support for a lithographic printing plate which, when measured over a 400 µm x 400 µm surface region thereon using a three-dimensional non-contact roughness tester, has at most 5.0 convex portions of a height from centerline of at least 0.70 µm and an equivalent circle diameter of at least 20 µm, and has at least 800 concave portions of a depth from centerline of at least 0.50 µm and an equivalent circle diameter of at least 2.0 µm. Presensitized plates which are obtainable by using the support for a lithographic printing plate according to the present invention have an excellent scumming resistance and an extremely long press life.
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公开(公告)号:AT443616T
公开(公告)日:2009-10-15
申请号:AT03004251
申请日:2003-02-26
Applicant: FUJIFILM CORP
Inventor: MATSUURA ATSUSHI , UESUGI AKIO , MIWA HIDEKI , NISHINO ATSUO , SAWADA HIROKAZU
IPC: B41N3/03
Abstract: The present invention provides a method for preparing an aluminum support for lithographic printing plate, the aluminum support for a lithographic printing plate obtained by the method and a presensitized plate using the same, characterized in that anodizing treatment is performed on an aluminum plate after hydrochloric acid electrolytic graining treatment if necessary, nitric acid electrolytic graining treatment are performed on the aluminum plate at a specified ratio of quantities of electricity, and with this method, a lower-purity aluminum plate could be used and a obtained support for a lithographic printing plate is excellent in press life and scum resistance when a lithographic printing plate is prepared.
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公开(公告)号:DE60132754D1
公开(公告)日:2008-03-27
申请号:DE60132754
申请日:2001-12-20
Applicant: FUJIFILM CORP
Inventor: TOMITA TADABUMI , TERAOKA KATSUYUKI , HOTTA HISASHI , MATSUURA ATSUSHI , UESUGI AKIO
Abstract: A lithographic printing plate precursor is disclosed, comprising a metal support having formed thereon an anodic oxide film, and an image-forming layer containing a light-to-heat converting agent, or a light-sensitive layer capable of image-forming with infrared laser exposure provided in this order from the support.
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公开(公告)号:AT385906T
公开(公告)日:2008-03-15
申请号:AT01130269
申请日:2001-12-20
Applicant: FUJIFILM CORP
Inventor: TOMITA TADABUMI , TERAOKA KATSUYUKI , HOTTA HISASHI , MATSUURA ATSUSHI , UESUGI AKIO
Abstract: A lithographic printing plate precursor is disclosed, comprising a metal support having formed thereon an anodic oxide film, and an image-forming layer containing a light-to-heat converting agent, or a light-sensitive layer capable of image-forming with infrared laser exposure provided in this order from the support.
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公开(公告)号:EP3330412A4
公开(公告)日:2018-07-18
申请号:EP16830567
申请日:2016-07-27
Applicant: FUJIFILM CORP
Inventor: KOZAWA YUSUKE , KAWAGUCHI JUNJI , MATSUURA ATSUSHI
CPC classification number: H01M4/70 , C22C21/00 , C23F1/36 , C25D9/04 , C25D11/04 , C25D11/20 , C25D11/24 , C25D13/12 , C25F3/04 , H01G11/06 , H01G11/68 , H01G11/70 , H01G11/84 , H01M4/661 , H01M4/72 , Y02E60/13
Abstract: An object is to provide an aluminum plate which has favorable adhesiveness and coating properties to active materials and has a high strength and a method for manufacturing an aluminum plate. An average opening diameter of the plurality of through holes is 0.1 µm or more and 100 µm or less, an average opening ratio of the plurality of through holes is 2% or more and 40% or less, among the plurality of through holes, a percentage of through holes having an opening diameter of 5 µm or less is 40% or less, among the plurality of through holes, a percentage of through holes having an opening diameter of 40 µm or more is 40% or less, and, among the plurality of through holes, a percentage of through holes in which a ratio S 1 /S 0 of an area S 1 of the through holes to an area S 0 of a circle having a long axis of the through hole as a diameter is 0.1 or more and 1 or less is 50% or more.
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