公开(公告)号：JPH07261367A

公开(公告)日：1995-10-13

申请号：JP4669194

申请日：1994-03-17

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA ,  HAIRI ISAMU

IPC: G03F1/29 ,  G03F1/32 ,  G03F1/68 ,  H01L21/027 ,  G03F1/08

Abstract: PURPOSE:To improve the corrosion resistance to a high energy light and to enhance the resolution by coating the surface of translucent film and phase shift film with a light shielding film and setting the area of the apertures of the light shielding film larger than the area of the apertures of the translucent film and phase shift film. CONSTITUTION:The surface of a transparent substrate 1 is provided successively with the translucent films 5 for exposing light of photoresist films, the phase shift films 2 for shifting the phases of this light and the light shielding films 3 of exposing light. The area of the apertures 4 of the light shielding films 3 is set larger than the area of the apertures 4 of the translucent films 5 and the phase shift films 2. Namely, the surfaces of the two-layered structural films composed of the translucent films 5 and the phase shift films 2 are coated with the light shielding films 3 consisting of chromium. The apertures 4 of the larger area than the area of the apertures 4 of the translucent films 5 and the phase shift films 2 are formed at the light shielding films 3 consisting of the chromium on the apertures 4. Since the translucent films 5 are surely shielded to light, the multiple exposing of the photoresist films does not arise any more and the resolution of the irradiation light transmitted therethrough is enhanced by the apertures 4.

公开(公告)号：JPH06151889A

公开(公告)日：1994-05-31

申请号：JP30262792

申请日：1992-11-12

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA ,  TSUBOI OSAMU

IPC: G01P15/08 ,  B81B3/00 ,  B81C1/00 ,  G01P15/02 ,  G01P15/125 ,  H01L29/84

Abstract: PURPOSE:To prevent adhesion between an upper movable electrode and a lower electrode in opposition thereto in an accelerometer having the upper electrode which deforms on receipt of acceleration and the lower electrode in opposition thereto. CONSTITUTION:The title device is constituted including a spindle part 3 which receives acceleration, a frame-like fixed part 1 enclosing the spindle part 3 with a clearance 2 between, a beam part 4 which puts the fixed part 1 and the spindle part 3 from below, an upper electrode 5 which is formed of an elastic conductive material, connects the fixed part 1 and the spindle part 3 and is provided with a rising part at a center, lower electrodes 27, 28 formed in a region in opposition to the upper electrode 5 in the fixed part 1 and a projection 25 which is formed a at least one of the upper electrode 5 and the lower electrodes 27, 28 and has a clearance between it and an opposite surface.

公开(公告)号：JPH063369A

公开(公告)日：1994-01-11

申请号：JP16592692

申请日：1992-06-24

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA

IPC: G01P15/02 ,  B81B3/00 ,  H01L29/84

Abstract: PURPOSE:To obtain such a highly efficient accelerometer that the stress of a beam from which a weight section is hung can be efficiently controlled and the material constituting the beam effectively functions as an etching mask. CONSTITUTION:In the title accelerometer, a weight section 15 which receives acceleration is hung from a beam 16 in a fixing section 14 which surrounds the section 15 with a space in between and the sections 15 and 14 are connected to each other through an upper electrode 6 composed of an elastic conductor. In addition, a detection electrode 4 is provided on the section 14 in a state where the electrode 4 is in contact with the electrode 6. The beam 16 is composed of a platy body manufactured by coating a metallic thin film 9 with thin films 8 and 11 of silicon carbide, silicon nitride, titanium nitride, or silicon oxide or a platy body consisting of a composite film of the metallic thin film 9 and thin film 8 of silicon carbide, silicon nitride, titanium nitride, or silicon oxide.

公开(公告)号：JPH05315315A

公开(公告)日：1993-11-26

申请号：JP11276192

申请日：1992-05-01

Applicant: FUJITSU LTD

Inventor： OSADA TOSHIHIKO ,  KITAMURA YOSHITAKA

IPC: H01L21/304 ,  B81C1/00

Abstract: PURPOSE:To provide a method for drying rinse liquid which was used for rinsing after etching for short time with no damages on levers (cantilever, center lever) in forming the levers on a semiconductor substrate by eliminating a sacrifice layer through etching, in relation to improvement of a method for forming levers on the semiconductor substrate. CONSTITUTION:A lever 4, which is supported by at least one point of a semiconductor substrate 1, is formed on the semiconductor substrate 1 through a sacrifice layer. At this time, after eliminating the sacrifice layer 2 through etching, the lever 4 is rinsed by dipping it in rinse liquid, and the lever 4 is formed on the semiconductor substrate 1 by drying the rinse liquid under decreased tension.

公开(公告)号：JPH04207016A

公开(公告)日：1992-07-29

申请号：JP34013590

申请日：1990-11-30

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA

IPC: H01L21/027

Abstract: PURPOSE:To form an X-ray mask which hardly cause the positional deviation of an X-ray absorber pattern by fixing the X-ray absorber pattern by wrapping the pattern with a stress absorbing film. CONSTITUTION:After an SiC film 2 is formed on the entire surface of an Si substrate l, a Ta layer 3 is grown on the surface of the film 2 as an X-ray absorber and a resist is applied to the surface of the layer 3. Then the layer 3 is patterned by etching by using the resist pattern as a mask. After the pattern is formed, an SiC film 4 is grown on the entire surface of the SiC film 2 including the pattern of the Ta layer 3 and the rear surface of the Si substrate 1 is stuck to a mask supporting frame 5 made of SiC. Then the rear surface of the substrate 1 exposed through the frame 5 is removed by etching. Since the pattern of the Ta layer 3 is formed on the SiC film 2, pattern modification can be performed extremely easily.

公开(公告)号：JPS6342123A

公开(公告)日：1988-02-23

申请号：JP18524486

申请日：1986-08-08

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA ,  YAMABE MASAKI ,  FURUKAWA YASUO

IPC: H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To shorten the time for exposure process while increasing the throughput by a method wherein an X-Y stage is continuously shifted stepwise in the direction orthogonal to a rotary axis of a rotating target (V-groove developing direction) while X-ray emitting electrode beams are oscillated synchronizing with the oscillation of stage in every step shifting to correct any fluctuation in an X-ray exposure region. CONSTITUTION:A mask alignment mechanism including an X-Y stage oscillates between an X-ray emitter 40 and itself while the oscillation is detected by pattern detectors 11 and 12 in the X and Y directions. Any deflection amount of electron beams required for correction of the oscillation is processed by a deflection amount processor 13 making reference to the detection signals and then deflectors (a), (b) 17, 18 in the X and Y directions are driven through the intermediary of deflecting amplifiers 15 and 16 according to the results of processing i.e. after specified alignment time elapsed, the electron beams 3 start deflecting to be oscillated synchronizing with the X-Y stage. At this time, a shutter 7 is opened to start exposing. During the time, the X-Y stage is being oscillated but the irradiating direction of X-rays 5 is kept constant to an exposure region by the synchroneous oscillation of electron beams to correct any fluctuation due to the oscillation.

公开(公告)号：JPS62165842A

公开(公告)日：1987-07-22

申请号：JP676686

申请日：1986-01-16

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA ,  YAMABE MASAKI ,  FURUKAWA YASUO

IPC: H05G2/00 ,  H01J35/22 ,  H05G1/00

Abstract: PURPOSE:To prevent a discharge between a metallic valve body and a coil, by linking a driving coil housing of a valve to an insulating gas chamber, and keeping the coil housing airtight to a plasma material gas flow passage. CONSTITUTION:The first insulating gas chamber 28 is linked to the second insulating gas chamber 29 which is composed to surround the outside of a housing 23 by a cylindrical body 22, and a housing of a coil 4 composed of an inner tube 23a and an outer tube 23b is linked to the insulating gas chamber 29 through a gap 30 where the inner tube 23a and the outer tube 23b opposes each other. To a pipe 31 to feed a plasma material gas to a plasma material gas chamber 24, O rings are inserted to all engaging parts. When a current is applied to the coil 4, a valve body 5 is pressed up impulsively, and the plasma material gas is injected into the plasma forming chamber to form a plasma gas column. When a discharge voltage is applied to an anode 2 and a cathode 3, X-rays generated from the gas column are emitted through an aperture 15 to a sample chamber 1. Then, the insulating gas flows in the housing of the coil 4, and no discharge occurs between the coil 4 and the valve body 5 because the insulation of the coil 4 is perfect.

公开(公告)号：JPS62126334A

公开(公告)日：1987-06-08

申请号：JP26767185

申请日：1985-11-28

Applicant: FUJITSU LTD

Inventor： KITAMURA YOSHITAKA ,  YAMABE MASAKI ,  FURUKAWA YASUO ,  OKABE MASAHIRO

IPC: G01N23/04 ,  G01N23/225 ,  G21K7/00

Abstract: PURPOSE:To make it possible to obtain the sharp image of a specimen, by taking out X-ray having a single wavelength to converge the same to a specimen and performing scanning with the converged spot by the deflection of electron beam. CONSTITUTION:The electron beam 37 emitted by an electronic gun 22 is converged by a converging lens 23 and deflected by a deflector 24 to irradiate a target 25. The target 25 emits X-ray beam 39 which is, in turn, transmitted through a wavelength filter 27 to be converged to a Fresnel zone plate 28 and the obtained converged spot of X-ray beam 40 with a single wavelength is projected to the specimen 36 positioned in front of an X-ray detector 29. A computer 32 projects the detection image of the detector 29 to a specimen 36 and alters the electron beam deflection condition of a deflector 24 to a predetermined one. An X-ray detector 30 detects the X-rays or secondary electron from the surface of the specimen and the detectors 29, 30 are changed over by a switch 35 to make it possible to simultaneously know the external and internal structures of the specimen.

公开(公告)号：JPS61260529A

公开(公告)日：1986-11-18

申请号：JP10202385

申请日：1985-05-14

Applicant: FUJITSU LTD

Inventor： YAMABE MASAKI ,  KITAMURA YOSHITAKA ,  FURUKAWA YASUO

IPC: H01J1/16 ,  H01J1/15 ,  H01J29/04

Abstract: PURPOSE:To simplify constitution and save energy by providing a thermion emission cathode whose thermion emission surface if formed by a band thermion emission member bent in plural stops. CONSTITUTION:A cathode 1 is so made that a tungsten line 2 having both lead ends 1a and 1b is bent in its middle part so as to be folded up inside a plane for forming an electron emission part 1c while in plural places of the middle part of the electron emission part 1c one end each of the metal lines 3 for supporting is welded. In the cathode 1 so constituted, the lead ends 1a and 1b are connected to the opposing terminals 4a and 4b respectively while the other end of each supporting line 3 is fixed to a heat-resisting and insulated supporting member 5 made of ceramics or the like.

公开(公告)号：JPS61163637A

公开(公告)日：1986-07-24

申请号：JP349185

申请日：1985-01-12

Applicant: FUJITSU LTD

Inventor： YAMABE MASAKI ,  KITAMURA YOSHITAKA ,  FURUKAWA YASUO

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To contrive the improvement in an operating efficiency by opening and closing the predetermined shutter on an optical path between an X-ray source and the X-ray spot observation window arranged oppositely to an X-ray extracting window and inserting or withdrawing a carrying table carrying the samples and masks. CONSTITUTION:A shutter 22 comprises a pin hole 26 for projecting an X-ray spot, a shielding region 27, and a transparent hole 25 and it is positioned by three steps. An observation window 24 made of a fluorescent glass plate is arranged at the bottom of a cylinder 28 beneath an exposure chamber 23 and a TV camera 29 is arranged outside said window. A table 13 carrying a sample 12 and a mask 11 is moved and when the pin hole 26 comes in accordance with an optical axis of an X-ray 16, an X-ray spot image formed by the electron beams hitting against a target 5 is projected on the fluorescent plate 24 by using the pin hole 26 as a lens and the image is measured by the camera 29. By this constitution, the measurement of the X-ray spot image becomes possible without changing an atmosphere in the exposure chamber and the stop of operation of the device when checking up the spot can be reduced.