公开(公告)号：CA2833965C

公开(公告)日：2019-07-09

申请号：CA2833965

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/30 ,  H05H1/46

Abstract: The present invention relates to a method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device. The device is provided with a microwave field choking effect by having a diameter of the exit channel larger than zero but smaller than 1/16 of the wavelength of the standing microwave within the microwave chamber and a length, ?, of the exit channel that may correspondingly have one of the following ranges: from a factor larger than zero but smaller than (n+1/8), n G {0, 1, 2, 3}, of the wavelength of the standing microwave within the microwave chamber.

公开(公告)号：GB2490355B

公开(公告)日：2015-10-14

申请号：GB201107130

申请日：2011-04-28

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/30 ,  H05H1/34 ,  H05H1/46

Abstract: A method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device.

公开(公告)号：PL2702839T3

公开(公告)日：2015-08-31

申请号：PL12723249

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/34

公开(公告)号：ES2540576T3

公开(公告)日：2015-07-10

申请号：ES12723249

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/34

Abstract: Un procedimiento de tratamiento de un gas, comprendiendo el procedimiento: • emplear un tanque alargado con un espacio interior de simetría cilíndrica, en el que el tanque alargado: i) sobresale a través de una cámara de microondas, ii) la pared de la parte del tanque alargado que no está en contacto con la cámara de microondas es opaca a la radiación de microondas, iii) la pared de la parte del tanque alargado que penetra en la cámara de microondas es transparente a la radiación de microondas, iv) el tanque alargado tiene en un primer extremo del tanque un canal cilíndrico alargado coaxial de salida con un diámetro interior, D, igual o menor que un factor de 1/16 de la longitud de onda de un campo aplicado de microondas dentro de la cámara de microondas, y una longitud, E, igual o menor que un factor de (n + 1/8), n ε {0, 1, 2, 3}, de la longitud de onda de un campo aplicado de microondas dentro de la cámara de microondas, y v) el tanque alargado está cerrado en un segundo extremo frente al primer extremo por medio de una pared inferior, • inyectar el gas a tratar, de modo que forme un primer flujo turbulento que discurre por la pared interior del espacio interior del tanque y luego se refleje desde la pared inferior en el segundo extremo para formar un segundo flujo turbulento del gas a tratar que discurre a lo largo del eje central del tanque desde la pared inferior del tanque y que sale por el canal de salida en el primer extremo, y • formar una microonda estacionaria en la cámara de microondas alineada para formar una cresta ondulatoria en el eje central del tanque en el área del tanque en la que es transparente a la energía de las microondas capaz de excitar al menos una porción del gas en el segundo vórtice para formar un plasma no térmico de microondas.

公开(公告)号：GB2490355A

公开(公告)日：2012-10-31

申请号：GB201107130

申请日：2011-04-28

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/30 ,  H05H1/34 ,  H05H1/46

Abstract: A method and device for processing a gas by forming a non-thermal microwave plasma of the gas. The gas that is to be processed is caused two follow a two or three co-axial vortex flow 202, 203, 204 inside the device 200 and is exposed to a standing wave microwave field from a microwave chamber 207 to form the plasma 209 in the inner co­axial vortex flow204. This is subsequently expelled as a plasma afterglow 205 through an outlet/exit channel of the device. The device is provided with a microwave field choking effect by the exit channel having a diameter, D, larger than zero but smaller than 1/16 of the wavelength of the standing wave microwave and a length, E, being larger than zero but smaller than (n+1/8), of the wavelength of the standing wave microwave, wherein n = {0, 1, 2, 3}.

公开(公告)号：DK2702839T3

公开(公告)日：2015-07-06

申请号：DK12723249

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/34

公开(公告)号：PT2702839E

公开(公告)日：2015-06-23

申请号：PT12723249

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/34

公开(公告)号：CA2833965A1

公开(公告)日：2012-11-01

申请号：CA2833965

申请日：2012-04-27

Applicant: GASPLAS AS

Inventor： RISBY PHILIP JOHN ,  PENNINGTON DALE

IPC: H05H1/30 ,  H05H1/46

Abstract: The present invention relates to a method and device for processing a gas by forming microwave plasmas of the gas. The gas that is to be processed is set in a two or three co-axial vortex flow inside the device and exposed to a microwave field to form the plasma in the inner co-axial vortex flow, which subsequently is expelled as a plasma afterglow through an outlet of the device. The device is provided with a microwave field choking effect by having a diameter of the exit channel larger than zero but smaller than 1/16 of the wavelength of the standing microwave within the microwave chamber and a length, ?, of the exit channel that may correspondingly have one of the following ranges: from a factor larger than zero but smaller than (n+1/8), n G {0, 1, 2, 3}, of the wavelength of the standing microwave within the microwave chamber.