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1.
公开(公告)号:US11988449B2
公开(公告)日:2024-05-21
申请号:US17442476
申请日:2019-03-25
Applicant: GEA Process Engineering A/S
Inventor: Mads Lund Steffensen , Kristian Mark Ingvorsen , Henrik Schwartzbach
Abstract: A spray drying apparatus has a spray drying chamber; a liquid feed atomizer; a drying gas disperser; a perforated bottom; and a plenum chamber with an outlet below the perforated bottom. At least one guide plate is provided in the plenum chamber to direct gas, which is passing through the perforated bottom into the plenum chamber, towards the bottom of the plenum chamber. The guide plates have lower edges extending on average down to at least half-way between the perforated bottom of the spray drying chamber and the bottom of the plenum chamber.
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公开(公告)号:US12072145B2
公开(公告)日:2024-08-27
申请号:US17254801
申请日:2018-06-29
Applicant: GEA Process Engineering A/S
Inventor: Mads Lund Steffensen , Kristian Mark Ingvorsen , Jasbir Dhanoa
Abstract: In the gas disperser (3), a flow conditioning device (5, 6) is located in the inlet duct section (32). The flow conditioning device comprises a hole plate (5) and a flow straightener (6) positioned in parallel with and at a distance (h) in the axial direction (axd) from the downstream side of the hole plate (5). The hole plate (5) has a predefined hole plate thickness (tp) in the axial direction (axd) and each flow straightener (6) has a predefined flow straightener length (Is) in the axial direction (axd), the flow straightener length (Is) being substantially larger than the hole plate thickness (tp).
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