Gas reservoir and a method to supply gas to plasma tubes
    2.
    发明授权
    Gas reservoir and a method to supply gas to plasma tubes 有权
    气藏和向等离子管供气的方法

    公开(公告)号:US09557009B2

    公开(公告)日:2017-01-31

    申请号:US14072911

    申请日:2013-11-06

    CPC classification number: F17C11/00 B01D53/0454

    Abstract: A reservoir for storing and supplying a portion of a reservoir gas into a gas-filled tube is presented. The reservoir includes a first vessel having a thermally conductive surface, a meshed vessel having a lid, and placed inside the first vessel to form a cavity between the meshed vessel and the first vessel, at least one tray placed inside the meshed vessel to divide an inner space of the meshed vessel into a plurality of compartments, a sorbent material placed inside the plurality of compartments in the meshed vessel, a temperature control device positioned such that a first portion of the temperature control device is in physical contact with at least a portion of the thermally conductive surface, and a change in the temperature of the temperature control device changes the temperature of the sorbent material, wherein the reservoir gas is retained by the sorbent material at the storage temperature.

    Abstract translation: 提出了一种用于将储存气体的一部分储存并供应到充气管中的储存器。 储存器包括具有导热表面的第一容器,具有盖的啮合容器,并放置在第一容器的内部以在啮合的容器和第一容器之间形成空腔,至少一个托盘放置在网状容器内部以分开 所述网状容器的内部空间形成多个隔室,设置在所述网状容器内的所述多个室内的吸附剂材料,所述温度控制装置定位成使得所述温度控制装置的第一部分与至少一部分物理接触 并且温度控制装置的温度变化改变吸附剂材料的温度,其中储存气体在储存温度下由吸附剂材料保持。

    GAS RESERVOIR AND A METHOD TO SUPPLY GAS TO PLASMA TUBES
    3.
    发明申请
    GAS RESERVOIR AND A METHOD TO SUPPLY GAS TO PLASMA TUBES 有权
    气体储存和向等离子体管供应气体的方法

    公开(公告)号:US20150122670A1

    公开(公告)日:2015-05-07

    申请号:US14072911

    申请日:2013-11-06

    CPC classification number: F17C11/00 B01D53/0454

    Abstract: A reservoir for storing and supplying a portion of a reservoir gas into a gas-filled tube is presented. The reservoir includes a first vessel having a thermally conductive surface, a meshed vessel having a lid, and placed inside the first vessel to form a cavity between the meshed vessel and the first vessel, at least one tray placed inside the meshed vessel to divide an inner space of the meshed vessel into a plurality of compartments, a sorbent material placed inside the plurality of compartments in the meshed vessel, a temperature control device positioned such that a first portion of the temperature control device is in physical contact with at least a portion of the thermally conductive surface, and a change in the temperature of the temperature control device changes the temperature of the sorbent material, wherein the reservoir gas is retained by the sorbent material at the storage temperature.

    Abstract translation: 提出了一种用于将储存气体的一部分储存并供应到充气管中的储存器。 储存器包括具有导热表面的第一容器,具有盖的啮合容器,并放置在第一容器的内部以在啮合的容器和第一容器之间形成空腔,至少一个托盘放置在网状容器内部以分开 所述网状容器的内部空间形成多个隔室,设置在所述网状容器内的所述多个室内的吸附剂材料,所述温度控制装置定位成使得所述温度控制装置的第一部分与至少一部分物理接触 并且温度控制装置的温度变化改变吸附剂材料的温度,其中储存气体在储存温度下由吸附剂材料保持。

    KRYPTON-85-FREE SPARK GAP WITH A DISCHARGE PROBE

    公开(公告)号:US20190013651A1

    公开(公告)日:2019-01-10

    申请号:US16130669

    申请日:2018-09-13

    Abstract: Embodiments of the present disclosure relate to a spark gap device that includes a first electrode having a first surface and a second electrode having a second surface offset from and facing the first surface. The spark gap device also includes a light source configured to emit light toward at least the first surface such that photons emitted by the light source when the spark gap is operated are incident on the first surface and cause electron emission from the first surface. The light source includes a discharge probe having a third electrode sealed in a tube filled with an inert gas. The spark gap device may not include a radioactive component.

    Bidirectional gas discharge tube
    9.
    发明授权

    公开(公告)号:US11482394B2

    公开(公告)日:2022-10-25

    申请号:US16740096

    申请日:2020-01-10

    Abstract: A bidirectional gas discharge tube (GDT) includes a discharge chamber, first and second cathodes, a gas disposed within the discharge chamber, and a control grid. The first and second cathodes are disposed within the discharge chamber and include first and second faces, respectively. The first face and the second face are plane-parallel. The gas is configured to insulate the first cathode from the second cathode. The control grid is disposed between the first and second cathodes within the discharge chamber. The control grid is configured to generate an electric field to initiate establishment of a conductive plasma between the first and second cathodes to close a conduction path extending between the first and second cathodes.

    Krypton-85-free spark gap with a discharge probe

    公开(公告)号:US10916919B2

    公开(公告)日:2021-02-09

    申请号:US16130669

    申请日:2018-09-13

    Abstract: Embodiments of the present disclosure relate to a spark gap device that includes a first electrode having a first surface and a second electrode having a second surface offset from and facing the first surface. The spark gap device also includes a light source configured to emit light toward at least the first surface such that photons emitted by the light source when the spark gap is operated are incident on the first surface and cause electron emission from the first surface. The light source includes a discharge probe having a third electrode sealed in a tube filled with an inert gas. The spark gap device may not include a radioactive component.

Patent Agency Ranking