-
1.
公开(公告)号:WO2019157406A1
公开(公告)日:2019-08-15
申请号:PCT/US2019/017391
申请日:2019-02-09
Inventor: TALBOT, Brian M. , SHELTON, Kurt G. , MCLOUGHLIN, Anne G. , CHIDA, Masayasu
Abstract: A controller: performing one or more iterations of a first process, the first process including: selecting at least one variable operating parameter of a laser light source of a lithotripsy device; determining a value of each of a plurality of base settings of the at least one variable operating parameter selected; and performing, in order, for the each of the plurality of base settings: setting the at least one variable operating parameter selected to the value of the each of the plurality of base settings; and controlling the laser light source to output laser light based on the value of the each of the plurality of base settings set; selecting one of the plurality of base settings; and performing one or more iterations of a second process, the second process including controlling the laser light source based on the one of the plurality of base settings selected.
-
2.
公开(公告)号:WO2019157406A9
公开(公告)日:2019-08-15
申请号:PCT/US2019/017391
申请日:2019-02-09
Inventor: TALBOT, Brian M. , SHELTON, Kurt G. , MCLOUGHLIN, Anne G. , CHIDA, Masayasu
Abstract: A controller: performing one or more iterations of a first process, the first process including: selecting at least one variable operating parameter of a laser light source of a lithotripsy device; determining a value of each of a plurality of base settings of the at least one variable operating parameter selected; and performing, in order, for the each of the plurality of base settings: setting the at least one variable operating parameter selected to the value of the each of the plurality of base settings; and controlling the laser light source to output laser light based on the value of the each of the plurality of base settings set; selecting one of the plurality of base settings; and performing one or more iterations of a second process, the second process including controlling the laser light source based on the one of the plurality of base settings selected.
-