LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20210288459A1

    公开(公告)日:2021-09-16

    申请号:US17337906

    申请日:2021-06-03

    Abstract: A laser system includes a random phase plate in an optical path between a solid-state laser device and an excimer amplifier. Cells of a predetermined shape are periodically arranged on the plate, each cell being a minimum unit region of an irregular pattern, regions of depressions or projections in units of the cells being randomly arranged. When a traveling direction of a laser beam is a Z direction, a discharge direction is a V direction, a direction orthogonal to the V and Z directions is an H direction, an in-plane direction of the plate corresponding to the V direction is a first direction, an in-plane direction of the plate corresponding to the H direction is a second direction, lengths of the cell are d1 in the first direction and d2 in the second direction, an aspect ratio of the cell defined by d2/d1 is 1.2 or more.

    LASER APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220393425A1

    公开(公告)日:2022-12-08

    申请号:US17818178

    申请日:2022-08-08

    Abstract: A laser apparatus according to an aspect of the present disclosure includes a master oscillator configured to emit a laser beam, an amplifier including an optical resonator and configured to amplify the laser beam emitted by the master oscillator in the optical resonator, and a phase shift structure disposed on an optical path between the master oscillator and the amplifier at a position closer to the amplifier than a middle point of the optical path. The phase shift structure includes a plurality of cells having different phase shift amounts for the laser beam. The cells have a disposition interval of 80 μm to 275 μm inclusive.

    LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220059988A1

    公开(公告)日:2022-02-24

    申请号:US17517982

    申请日:2021-11-03

    Abstract: A laser system includes a beam shaping unit, a random phase plate, and a collimating optical system in an optical path between a solid-state laser device and an excimer amplifier. When a traveling direction of a laser beam entering the excimer amplifier is a Z direction, a discharge direction of a pair of discharge electrodes is a V direction, a direction orthogonal to the V and Z directions is an H direction, a shaping direction of the beam shaping unit corresponding to the V direction is a first direction, a shaping direction of the beam shaping unit corresponding to the H direction is a second direction, an expansion rate in the first direction is E1, and an expansion rate in the second direction is E2, the beam shaping unit expands a beam section of the laser beam such that an expansion ratio defined by E2/E1 is higher than 1.

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