公开(公告)号：US07545552B2

公开(公告)日：2009-06-09

申请号：US11583575

申请日：2006-10-19

Applicant: Gregory David U'Ren

Inventor： Gregory David U'Ren

IPC: G02B26/00 ,  G02B26/08

CPC classification number: B81B3/0072 ,  B81B2201/047 ,  B81B2203/0109 ,  B81B2203/053 ,  B81C2201/017 ,  G02B26/001

Abstract: Disclosed is a microelectromechanical systems (MEMS) device and method of manufacturing the same. MEMS such as an interferometric modulator include a sidewall spacer formed adjacent to a movable mirror. The sidewall spacer may be a sacrificial spacer that is removed during fabrication, or it may remain in the final product. Increased clearance is provided between the movable mirror and a support structure during actuation of the movable mirror, thereby avoiding contact during operation of the interferometric modulator. The deformable layer may be deposited in a more continuous fashion over the contour of a lower layer as determined by the contour of the sidewall spacer, resulting in a stronger and more resilient deformable layer.

Abstract translation: 公开了一种微机电系统（MEMS）装置及其制造方法。 诸如干涉式调制器的MEMS包括邻近可移动反射镜形成的侧壁间隔物。 侧壁间隔件可以是在制造期间被去除的牺牲间隔物，或者它可以保留在最终产品中。 在可移动镜的致动期间，在可移动镜和支撑结构之间提供增加的间隙，从而避免在干涉式调制器的操作期间的接触。 可变形层可以以更连续的方式沉积在由侧壁间隔物的轮廓确定的较低层的轮廓上，从而形成更坚固且更具弹性的可变形层。

公开(公告)号：US20080094686A1

公开(公告)日：2008-04-24

申请号：US11583575

申请日：2006-10-19

Applicant: Gregory David U'Ren

Inventor： Gregory David U'Ren

IPC: G02B26/00

CPC classification number: B81B3/0072 ,  B81B2201/047 ,  B81B2203/0109 ,  B81B2203/053 ,  B81C2201/017 ,  G02B26/001

Abstract: Disclosed is a microelectromechanical systems (MEMS) device and method of manufacturing the same. MEMS such as an interferometric modulator include a sidewall spacer formed adjacent to a movable mirror. The sidewall spacer may be a sacrificial spacer that is removed during fabrication, or it may remain in the final product. Increased clearance is provided between the movable mirror and a support structure during actuation of the movable mirror, thereby avoiding contact during operation of the interferometric modulator. The deformable layer may be deposited in a more continuous fashion over the contour of a lower layer as determined by the contour of the sidewall spacer, resulting in a stronger and more resilient deformable layer.

Abstract translation: 公开了一种微机电系统（MEMS）装置及其制造方法。 诸如干涉式调制器的MEMS包括邻近可移动反射镜形成的侧壁间隔物。 侧壁间隔件可以是在制造期间被去除的牺牲间隔物，或者它可以保留在最终产品中。 在可移动镜的致动期间，在可移动镜和支撑结构之间提供增加的间隙，从而避免在干涉式调制器的操作期间的接触。 可变形层可以以更连续的方式沉积在由侧壁间隔物的轮廓确定的较低层的轮廓上，从而形成更坚固且更具弹性的可变形层。