公开(公告)号：JP2002362932A

公开(公告)日：2002-12-18

申请号：JP2002078840

申请日：2002-03-20

Applicant: SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

Inventor： WERDECKER WALTRAUD ,  GERTIG UDO ,  LEIST JOHANN ,  KOEPPLER RAINER DR

IPC: C03B20/00 ,  C01B33/12 ,  C03B19/06 ,  C03B19/12 ,  C03C3/06 ,  C03C14/00 ,  C04B35/14 ,  C04B35/653

Abstract: PROBLEM TO BE SOLVED: To inexpensively produce a composite material which has high density and high temperature variation resistance. SOLUTION: In the method for producing a composite material containing an SiO2 -containing matrix in which quartz glass particles have been buried, a suspension is prepared from a particle mixture of subdevided SiO2 powder having at least two different particle fragments and quartz glass particles, and a green compact is compacted therefrom, and the compact is sintered. The matrix contains SiO2 of at least 99 wt.%, and is formed at least of first (33) and second (35) particle fragments, and each particle fragment shall be present as synthetic amorphous SiO2 primary particles (2) of a nanoscale having a mean primary particle size of

公开(公告)号：JP2004131380A

公开(公告)日：2004-04-30

申请号：JP2003329314

申请日：2003-09-22

Applicant: Heraeus Quarzglas Gmbh & Co Kg ,  Shinetsu Quartz Prod Co Ltd ,  ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー ,  信越石英株式会社

Inventor： WERDECKER WALTRAUD ,  FISCHER GERO ,  ULRICH KIRST ,  LEIST JOHANN

IPC: C03B20/00 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00

CPC classification number: C03C11/00 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C3/06 ,  C03C2201/80 ,  C03C2203/20

Abstract: PROBLEM TO BE SOLVED: To provide a process for manufacturing an opaque quartz glass, especially a large opaque quartz glass material, employing slip casting which reduces or removes defects associated with shrinkage at drying.
SOLUTION: In the process for manufacturing the opaque quartz glass material, amorphous SiO
2 particles having particle sizes and a particle size distribution wherein D
50 is ≤15 μm and D
90 is≤50 μm are obtained by finely pulverizing amorphous SiO
2 granules in a liquid; by lowering the pH value, a homogeneous base slip having a solid content of 75 wt.% or higher is prepared; and quartz glass granules are mixed into the homogeneous base slip to form a composite slip having a density of at least 1.85g/cm
3 .
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2001206725A

公开(公告)日：2001-07-31

申请号：JP2000387153

申请日：2000-12-20

Applicant: SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

Inventor： WERDECKER WALTRAUD ,  LEIST JOHANN ,  FABIAN HEINZ ,  GOEBEL ROLF ,  UEBBING BRUNO ,  ROSIN ERICH

IPC: C03B20/00 ,  B05D1/12 ,  C03B8/00 ,  C03B19/09 ,  C03C3/06 ,  C30B25/08 ,  C30B31/10 ,  C30B35/00 ,  H02K3/34

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a pure opaque quartz glass article by which the possibility of contamination in the manufacture process is reduced, and to provide the pure opaque quartz glass article characterized by the resistance against the change of temperature, strength and chemical durability. SOLUTION: A mixture of refined natural quartz granule with Si3N4 powder is charged into a tubular metallic mold 2 rotating around the longitudinal axis 3, successively a counter electrode 8 is introduced into an inner hole 6 from one end of a hollow cylinder 1 and moved continuously along the inside wall 9 of the cylinder to another end of the hollow cylinder 1 to form the molten front face 10 in the hollow cylinder 1, the front face advances toward the outside in the direction of the metallic mold and a boundary between the continuous pore region 11 and the opaque partially molten region 12 is formed. As the result, a region between the inner hole 6 and the inside wall 9 is highly compacted by the high temperature of arc 7 to obtain a molten body 12 having an inner region 15 constituted of a high density transparent quartz glass.

公开(公告)号：JP2004131378A

公开(公告)日：2004-04-30

申请号：JP2003327365

申请日：2003-09-19

Applicant: Heraeus Quarzglas Gmbh & Co Kg ,  Shinetsu Quartz Prod Co Ltd ,  ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー ,  信越石英株式会社

Inventor： WERDECKER WALTRAUD ,  LEIST JOHANN ,  GERTIG UDO ,  KOEPPLER RAINER

IPC: C03B20/00 ,  C03B8/02 ,  C03B19/06 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C2201/80 ,  C03C2203/20

Abstract: PROBLEM TO BE SOLVED: To provide a homogeneous opaque glass containing no crystalline substance.
SOLUTION: A known manufacturing process for an opaque quartz glass material comprises steps wherein a suspension comprising SiO
2 particles and a liquid is prepared, the suspension is homogenized, the suspension is injected into a mold, the suspension is dried, a porous base made of the suspension is formed and the base is sintered to form the quartz glass material. Based on the process, an improved process which is inexpensive and highly reproducible is developed to realize high purity and markedly homogenous, high porosity. In the improved process, at least a portion of the particles are porous particles formed from aggregates of amorphous, synthetically prepared, nanometer-scaled SiO
2 primary particles having an average primary particle size of ≤100 nm, the porous particles having particle sizes of ≤1mm.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2000327478A

公开(公告)日：2000-11-28

申请号：JP2000111169

申请日：2000-04-12

Applicant: SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

Inventor： FABIAN HEINZ ,  ARNDT MARTIN ,  LEIST JOHANN ,  GERTIG UDO ,  ENGLISCH WOLFGANG

IPC: C03B20/00 ,  A01H5/00 ,  C03B19/09 ,  C03B23/00 ,  C03C15/00 ,  C03C19/00 ,  C30B15/10 ,  C30B29/06 ,  C30B35/00

Abstract: PROBLEM TO BE SOLVED: To provide a quartz glass crucible having an inner side surface area subjected to surface roughening in at least a start zone by many recesses arranged at inter-spacings of 5 mm in maximum in order to facilitate the start process based on the known quartz glass crucible having a crucible body and the inner side layer of the quartz glass. SOLUTION: A synthetic SiO2 grain layer is formed on the inside surface of a natural quartz grain layer 13. This synthetic SiO2 grain layer is heated and melted by a plasma, by which the transparent inner side layer 15 of high- purity SiO2 is formed and is simultaneously subjected to flame polishing. In succession, the surface area of the inner side layer 15 in the start zone 16 extending to encircle the circumference of the crucible body is subjected to the surface roughening by means of etching, embossing of the recessed patterns to the softened inner side surface of the crucible, inscribing of scribing lines by a polishing tool or blowing of frozen CO2 pellets, forming of a pore- containing air bubble layer by adding Si3N4 and releasing gaseous nitrogen.

公开(公告)号：JP2001354438A

公开(公告)日：2001-12-25

申请号：JP2001120924

申请日：2001-04-19

Applicant: SHINETSU QUARTZ PROD ,  HERAEUS QUARZGLAS

Inventor： GERTIG UDO ,  LEIST JOHANN ,  WERDECKER WALTRAUD ,  LEBER HELMUT

IPC: C03B20/00 ,  C03B19/00 ,  C03B19/09 ,  C03B23/047 ,  C03B23/049 ,  C03C3/06 ,  C03C11/00

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a member made from opaque quartz glass which is capable of producing the member having high chemical purity and high dimensional accuracy, more particularly a thin circular tube or tubular part at a low cost, and such quartz glass member. SOLUTION: This method for manufacturing the opaque quartz glass member consists in (i) preparing a starting material in the form of a high-purity synthetic SiO2 granular material which is at least partially porous SiO2 primary particle aggregate and having compressive bulk density of >=0.8 g/cm3, (ii) packing this granular material into dies and converting the granular material to the opaque quartz glass through a melting process step and (iii) forming a perform in a thermal forming process step. The quartz glass tube manufactured by this method and more particularly the quartz glass tube suitable for utilization in manufacture of semiconductors are made from the quartz glass consisting of the granular material of synthetic SiO2 having a lithium content below 100 weight ppb and have a thickness of 0.5 to 15 mm.

公开(公告)号：WO9850599A3

公开(公告)日：1999-02-04

申请号：PCT/EP9802685

申请日：1998-05-07

Applicant: HERAEUS QUARZGLAS ,  HELLMANN DIETMAR ,  LEIST JOHANN

Inventor： HELLMANN DIETMAR ,  LEIST JOHANN

IPC: C03B20/00 ,  B24C1/06 ,  C03B19/08 ,  C03B19/09 ,  C03C11/00 ,  C03C15/00 ,  C03C17/00 ,  C03C17/02 ,  C03C17/23 ,  C23C16/00

CPC classification number: C03C15/00 ,  B24C1/06 ,  C03B19/095 ,  C03C11/007 ,  C03C17/003 ,  C03C17/02 ,  C03C17/23 ,  C03C2204/04 ,  C03C2204/06 ,  C03C2217/213 ,  C03C2218/33 ,  Y10T428/24364 ,  Y10T428/24942 ,  Y10T428/249969 ,  Y10T428/249988 ,  Y10T428/24999

Abstract: The invention relates to a traditional, bell-shaped quartz glass component for a reactor chamber of a plasma etching device. This traditional quartz glass component comprises a substrate body made of a first quartz glass quality, and an inner surface facing a reactor interior. This inner surface has an average surface roughness Ra of more than 1 νm in at least one wrinkle area. The invention seeks to obtain a quartz glass component for a reactor housing which produces, as far as possible, no particles in the reactor chamber; whose interior surface, which faces the reactor interior, demonstrates high adhesion for material coatings deposited thereon; and which is particularly long-lasting. To this end, the wrinkle area consists of a bubble layer deposited on the substrate body and made of a second quartz glass quality with open pores. The invention also relates to a simple method for producing a quartz glass component of this kind, which enables the reproducible setting of a given surface roughness. The method comprises the following steps: a blank is moulded from a SiO2-containing grain mix; the blank is partially or completely vitrified by heating to a temperature over 1000 °C; an additional component, which reacts during vitrification on release of a gas, is admixed to the SiO2-containing grain mix in a wrinkle area during moulding of the blank interior surface. As a result of this, a porous bubble layer is produced in the wrinkle area during vitrification.

公开(公告)号：DE102009056751B4

公开(公告)日：2011-09-01

申请号：DE102009056751

申请日：2009-12-04

Applicant: HERAEUS QUARZGLAS

Inventor： WERDECKER WALTRAUD ,  OBERLE BURKHARD ,  LEIST JOHANN ,  GOEBEL ROLF ,  GUENTHER PAUL

IPC: C03B20/00

Abstract: Es ist ein Verfahren für die Herstellung eines Tiegels aus Quarzglas mit einem in einem Polygon angeordneten und mit einem ebenen Boden verbundenen Seitenwänden bekannt, wobei die Seitenwände erzeugt werden, indem aus SiO2-Körnung in einer rotierenden Schmelzform eine Körnungsschicht um ein Formwerkzeug gebildet und diese nach Entnahme des Formwerkzeugs mittels einer Heizquelle bereichsweise erschmolzen wird. Um hiervon ausgehend die Herstellung preiswerter Tiegel, insbesondere Solartiegel aus Quarzglas, mit hoher Maßhaltigkeit zu ermöglichen, wird erfindungsgemäß vorgeschlagen, dass der Boden erzeugt wird, indem aus SiO2-Körnung eine Körnungsschicht gebildet, diese thermisch oder mechanisch zu einer Bodenplatte verfestigt, und die verfestigte Bodenplatte in der Schmelzform mit den Seitenwänden versehen wird.

公开(公告)号：DE102009056751A1

公开(公告)日：2011-06-09

申请号：DE102009056751

申请日：2009-12-04

Applicant: HERAEUS QUARZGLAS

Inventor： WERDECKER WALTRAUD ,  OBERLE BURKHARD ,  LEIST JOHANN ,  GOEBEL ROLF ,  GUENTHER PAUL

IPC: C03B20/00

公开(公告)号：DE50201295D1

公开(公告)日：2004-11-18

申请号：DE50201295

申请日：2002-03-20

Applicant: HERAEUS QUARZGLAS

Inventor： WERDECKER WALTRAUD ,  GERHARDT ROLF ,  LEIST JOHANN

IPC: C03B20/00 ,  C03C17/00 ,  C03C17/22 ,  C03C17/245 ,  C03C17/34 ,  C23C4/00 ,  C23C4/10 ,  C23C4/11 ,  C30B15/10 ,  C30B29/06 ,  C30B35/00

Abstract: Disclosed is a component made of quartz glass, especially a crucible. A blank is provided with a stabilizing layer exhibiting a higher softening temperature than quartz glass. In order to provide a quartz glass component which is characterized by high mechanical and thermal resistance, in addition to providing a simple, cost-effective method for the production of said component, the chemical composition of the stabilizing layer (3; 6; 7; 38) is different from that of the quartz glass and said layer is applied by means of heat injection. The inventive method is characterized in that a stabilizing layer (3; 6; 7; 38) whose chemical composition is different from that of quartz glass is applied by heat injection.