公开(公告)号：US20190237296A1

公开(公告)日：2019-08-01

申请号：US16260988

申请日：2019-01-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko OTANI ,  Yohei MINEKAWA ,  Takashi NOBUHARA ,  Nobuhiko KANZAKI ,  Takehiro HIRAI ,  Miyuki FUKUDA ,  Yuya ISOMAE ,  Kaori YAESHIMA ,  Yuji TAKAGI

IPC: H01J37/22 ,  G06T7/73 ,  G06T7/13 ,  G06T7/60 ,  G02B21/00 ,  G02B21/36 ,  G06T7/00 ,  H01J37/28

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.