公开(公告)号：DE3246106A1

公开(公告)日：1984-06-14

申请号：DE3246106

申请日：1982-12-13

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/032 ,  G03F7/00

公开(公告)号：DE3040157A1

公开(公告)日：1982-06-03

申请号：DE3040157

申请日：1980-10-24

Applicant: HOECHST AG

Inventor： BUHR GERHARD DIPL CHEM DR ,  RUCKERT HANS DIPL CHEM DR ,  STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  C07C67/00 ,  C07C241/00 ,  C07C247/16 ,  G03F7/022 ,  G03F7/08 ,  G03F7/26

Abstract: A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I in which R1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

公开(公告)号：DE2847878A1

公开(公告)日：1980-05-22

申请号：DE2847878

申请日：1978-11-04

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03F7/023 ,  H01L21/027 ,  G03F7/08

公开(公告)号：DE3637717A1

公开(公告)日：1988-05-11

申请号：DE3637717

申请日：1986-11-05

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03F7/004 ,  G03F7/095 ,  G03F7/10

公开(公告)号：DE3144499A1

公开(公告)日：1983-05-19

申请号：DE3144499

申请日：1981-11-09

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/26 ,  G03F7/08

Abstract: Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a1) a compound forming an acid on exposure and (a2) a compound having at least one C-O-C bond cleavable by acid; (b) a water-insoluble binder soluble in aqueous-alkaline solutions; (c) an organic compound forming an acid on exposure of the general formula I in which X is a single bond or one of the groups CO, SO2, N=N or CR7R8, R1, R2, R3 and R4 are hydrogen atoms, halogen atoms or nitro groups, with not more than two of these radicals being hydrogen atoms and at least one thereof being a nitro group, R5 and R6 are hydrogen atoms or 1,2-naphthoquinone-2-diazide-4-sulfonyloxy radicals, with R5 and R6 being always different from each other, and R7 and R8 are hydrogen atoms or lower alkyl radicals, and (d) an azo dyestuff containing at least one nitro group in the molecule. Also disclosed are printing plates and photoresists prepared with the light-sensitive mixtures.

公开(公告)号：DE3039926A1

公开(公告)日：1982-05-27

申请号：DE3039926

申请日：1980-10-23

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: C07C43/20 ,  C07C27/00 ,  C07C39/15 ,  C07C41/00 ,  C07C45/00 ,  C07C49/83 ,  C07C49/84 ,  C07C67/00 ,  C07C241/00 ,  C07C247/16 ,  C07C313/00 ,  C07C323/20 ,  G03C1/72 ,  G03F7/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/40

公开(公告)号：DE3711264A1

公开(公告)日：1988-10-13

申请号：DE3711264

申请日：1987-04-03

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/08

公开(公告)号：DE3711263A1

公开(公告)日：1988-10-13

申请号：DE3711263

申请日：1987-04-03

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03F7/08

Abstract: A description is given of a light-sensitive mixture, a registration material prepared therewith and the production of negative relief copies. A light-sensitive material which contains, as light-sensitive compound, an ester or an amide of a 1,2-quinone-diazide sulphonic acid or carboxylic acid, binder and an s-triazine of the general formula I … … where R1 may be alkyl or alkyl, and… R2 may be alkoxy, aryloxy or an amino group mono- or disubstituted by alkyl, cycloalkyl or aryl is imagewise exposed under a negative photographic mask, then heated, exposed after cooling without a photographic mask or, optionally, under a positive photographic mask, and then developed with an aqueous alkaline developer. … …

公开(公告)号：DE3043967A1

公开(公告)日：1982-06-24

申请号：DE3043967

申请日：1980-11-21

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03C1/56 ,  G03C5/18 ,  G03F1/00 ,  G03F7/00 ,  G03F7/022 ,  G03C1/52 ,  G03F7/08

Abstract: A light-sensitive composition, especially suitable for preparation of planographic printing plates, comprising a water-insoluble resinous binder which is soluble or swellable in aqueous alkaline solutions, and a naphthoquinonediazide sulfonic acid ester of the general formula I (I) wherein D represents a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical and R represents an alkyl or aryl radical. Printing plates produced with such compositions exhibit good resistance to aqueous alkaline developers, alcohol-containing moistening liquids and gasoline hydrocarbons.

公开(公告)号：DE2641100A1

公开(公告)日：1978-03-16

申请号：DE2641100

申请日：1976-09-13

Applicant: HOECHST AG

Inventor： STAHLHOFEN PAUL DIPL CHEM DR

IPC: G03C1/72 ,  G03C5/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/105 ,  H01L21/027 ,  G03C1/727 ,  G03C1/52

Abstract: This invention relates to a photosensitive composition comprising an ester or an amide of an o-naphthoquinone diazide sulfonic or carboxylic acid and, based on the amount of this compound, about 1 to 50 per cent by weight of an organic dye capable of salt formation and about 5 to 75 per cent by weight of a photosensitive halogen-containing compound which releases acid upon exposure to light and having one of the general formulae I or II I II in which Ra is an aryl group or a heterocyclic group which may be substituted, Rb is a trihaloalkyl group or a trihaloalkenyl group having from 1 to 3 carbon atoms, and n is 1, 2 or 3.