LIGHT-SENSITIVE POLYCONDENSATION PRODUCT WITH DIAZONIUM GROUPS, PROCESS FOR THE PREPARATION THEREOF AND LIGHT-SENSITIVE REGISTRATION MATERIAL WHICH CONTAINS THIS POLYCONDENSATION PRODUCT

    公开(公告)号:DE3463979D1

    公开(公告)日:1987-07-02

    申请号:DE3463979

    申请日:1984-03-20

    Applicant: HOECHST AG

    Abstract: A light-sensitive, diazonium group-containing polycondensation product is described which comprises (a) an optionally substituted diphenylamine-dianzonium salt I. (b) a compound corresponding to the formula II R4-O-CH2-R5 (II) wherein R4 is H, alkyl or acyl, and R5 is an optionally substituted aromatic radical, and (c) a compound corresponding to the formula III R6-O-CH2-R8-CH2-O-R7 (III) wherein R6 and R7 are H, alkyl, or acyl and R8 is the radical of a compound selected from the group consisting of aromatic hydrocarbons, phenols, phenolethers, aromatic thioethers, aromatic heterocyclic compounds, and organic acid amides, with the radicals resulting from compound II being directing linked to the units of the diazonium salt I. In the production of the polycondensation product, I is first condensed with II and then with III. The product is suitable for use as a light-sensitive substance in recording materials, particularly in printing plates, and yields light-hardening products which have an increased oleophilicity.

    METHOD OF MAKING PRINTING SCREENS BY A GALVANIC METHOD

    公开(公告)号:DE3163156D1

    公开(公告)日:1984-05-24

    申请号:DE3163156

    申请日:1981-03-16

    Applicant: HOECHST AG

    Abstract: This invention relates to an improvement in the process for the preparation of screen printing stencils by an electroplating method, which comprises coating a metallic matrix, provided in the manner of a screen with dots of insulating material, with a photoresist layer, exposing the photoresist layer imagewise and developing it by washing out, and rendering those areas of the photoresist layer which have remained in place electrically conductive in the course of imaging, electrodepositing metal up to a desired height on the conductive image stencil and on the matrix ridges surrounding the insulating screen dots, and removing the patterned screen printing stencil thus obtained from the matrix, the improvement which comprises rendering the photoresist layer conductive only on its surface and before developing.

    8.
    发明专利
    未知

    公开(公告)号:DE58908406D1

    公开(公告)日:1994-10-27

    申请号:DE58908406

    申请日:1989-12-13

    Applicant: HOECHST AG

    Abstract: Compounds of the general formula I (I) are described in which R1 is a group of the formula and R2 is a hydrogen atom or a methyl group, or R1 and R2 jointly form an optionally substituted 5- or 6-membered ring, R3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group, R4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH2OA, CH2NHA or C2H4OA, and A is an acryloyl or methacryloyl group, the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.

    10.
    发明专利
    未知

    公开(公告)号:DE2407033A1

    公开(公告)日:1975-09-04

    申请号:DE2407033

    申请日:1974-02-14

    Applicant: HOECHST AG

    Abstract: Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula WHERE R is hydrogen or methyl; R1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C1 to C2) alkoxy, carbo-(C1 to C2)-alkoxy, (C1 to C2)acyl or (C1 to C2)acyloxy and R2 and R3, independently, each are (C1 to C4)alkyl or chlorine; and R4 is (C1 to C4)alkyl, nitro, chlorine or bromine, are provided.

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