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公开(公告)号:GB2301884A
公开(公告)日:1996-12-18
申请号:GB9511760
申请日:1995-06-06
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor: DAENDLIKER RENE , GRAY SIMON , SCHNELL URBAN
Abstract: A method and apparatus are disclosed for characterising a one or more layer thin film system on a substrate, in particular in respect of layer thickness and refractive index, and for measuring the distance between two surfaces, wherein at least one of the surfaces comprises a one- or multi-layer system, taking into account, and allowing rectification of, the phase contribution from the thin film stack, by interferometry, in particular by white-light channelled spectrum interferometry or multi-wavelength interferometry.