中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

26 records (took 0.023 seconds)

    PREPARATION OF MIXED-HALOGEN HALO-SILANES
    1.
    发明申请
    PREPARATION OF MIXED-HALOGEN HALO-SILANES 审中-公开
    混合的卤代甲硅烷的制备

    公开(公告)号：WO03072502A2

    公开(公告)日：2003-09-04

    申请号：PCT/US0306101

    申请日：2003-02-27

    Applicant: HONEYWELL INT INC

    Inventor： ASIRVATHAM EDWARD ,  CZARNECKI JEFF ,  LULY MATTHEW H ,  MULLAN LAWRENCE F ,  THENAPPAN ALAGAPPAN

    IPC: C01B33/107 ,  C07F7/12

    CPC classification number: C01B33/107 ,  C07F7/123

    Abstract: The preparation of halosilanes having mixed-halogen substituents is described comprising providing an aryl-halo-silane having one more first halogens and one or more aryl groups, and substituting one or more of said aryl groups of said aryl-halo-silane with a second halogen having an atomic number greater than that of said first halogen.

    Abstract translation: 描述了具有混合卤素取代基的卤代硅烷的制备，其包括提供具有一个以上第一卤素和一个或多个芳基的芳基卤代硅烷，并用第二个取代基代替所述芳基卤代硅烷的所述芳基中的一个或多个 原子序数大于所述第一卤素的原子数的卤素。

    VAPORIZABLE METALORGANIC COMPOUNDS FOR DEPOSITION OF METALS AND METAL-CONTAINING THIN FILMS
    3.
    发明申请
    VAPORIZABLE METALORGANIC COMPOUNDS FOR DEPOSITION OF METALS AND METAL-CONTAINING THIN FILMS 审中-公开
    用于金属沉积和含金属薄膜的可蒸发金属化合物

    公开(公告)号：WO2007005088A3

    公开(公告)日：2007-05-18

    申请号：PCT/US2006014752

    申请日：2006-04-17

    Applicant: HONEYWELL INT INC ,  THENAPPAN ALAGAPPAN ,  LAO JINGYU ,  NAIR HARIDASAN K ,  DEVI ANJANA ,  BHAKTA RAGHUNANDAN ,  MILANOV ANDRIAN

    Inventor： THENAPPAN ALAGAPPAN ,  LAO JINGYU ,  NAIR HARIDASAN K ,  DEVI ANJANA ,  BHAKTA RAGHUNANDAN ,  MILANOV ANDRIAN

    IPC: C07F7/00 ,  C07F9/00 ,  C23C16/00 ,  H01L21/00

    CPC classification number: C23C16/45553 ,  C07F7/006 ,  C07F9/005 ,  C23C16/405

    Abstract: A new class of metalorganic vaporizable compounds with mixed ligands is described herein, along with their use for the deposition of thin films of metals and metal- containing oxides, nitrides, oxynitrides, silicates, suicides, metal containing materials, and combinations thereof. . The metalorganic vaporizable compounds comprise amides in combination with malonates and guanidinates as donor-functionalized bidentate chelating ligands. The use of a metalorganic vaporizable compounds with mixed ligands to deposit and modify thin films of Hf, Zr, Ti, Ta, Al, Sn, Zn, Ca, Mg, Ga, In, Tl, Sc, Bi, Rh, Ir, La, Pr, Eu, Gd, Ba, Sr, and other lanthanide metal oxides, nitrides, oxynitrides, silicates, suicides, and composites, and further use of metalorganic vaporizable compounds with mixed ligands to deposit thin films of Ru, Cu, Co, Ag, Au, Pd, Pt, Ni, Fe, Mn, Cr, V, Nb, Pb, W, Si, Ge and Mo metals, metal oxides, nitrides, oxynitrides, silicates, suicides and combinations thereof are also described herein. A process for the preparation of metalorganic vaporizable compounds comprising amides in combination with donor-functionalized bidentate chelating ligands as a mixed ligand system is described herein. In addition, the use of metalorganic vaporizable compounds in various vapor phase deposition processes such as metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) of metals and metal-containing oxide thin films is described herein.

    Abstract translation: 本文描述了一类新的具有混合配体的金属有机气化化合物，以及它们用于沉积金属和含金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物，含金属材料及其组合的薄膜的用途。 。 金属有机可汽化化合物包含与丙二酸盐和胍盐组合的酰胺作为供体官能化的二齿螯合配体。 使用具有混合配体的金属有机可汽化化合物沉积和修饰Hf，Zr，Ti，Ta，Al，Sn，Zn，Ca，Mg，Ga，In，Tl，Sc，Bi，Rh，Ir，La中的薄膜 ，Pr，Eu，Gd，Ba，Sr和其他镧系元素金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物和复合材料，并进一步使用具有混合配体的金属有机可汽化化合物沉积Ru，Cu，Co，Ag 本文还描述了Au，Pd，Pt，Ni，Fe，Mn，Cr，V，Nb，Pb，W，Si，Ge和Mo金属，金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物及其组合。 本文描述了一种制备包含与供体官能化的二齿螯合配体作为混合配体体系的酰胺的金属有机可汽化化合物的方法。 另外，本文描述了在金属有机化学气相沉积（MOCVD）和金属和含金属的氧化物薄膜的原子层沉积（ALD）的各种气相沉积工艺中使用金属有机可汽化化合物。

    SYNTHESIS OF CHLOROTRIFLUOROETHYLENE-BASED BLOCK COPOLYMERS BY IODINE TRANSFER POLYMERIZATION
    5.
    发明公开
    SYNTHESIS OF CHLOROTRIFLUOROETHYLENE-BASED BLOCK COPOLYMERS BY IODINE TRANSFER POLYMERIZATION 有权
    合成二氯乙烯苯乙烯嵌段共聚物去离子水

    公开(公告)号：EP3052536A4

    公开(公告)日：2017-05-17

    申请号：EP14848121

    申请日：2014-09-12

    Applicant: HONEYWELL INT INC ,  CENTRE NAT RECH SCIENT

    Inventor： THENAPPAN ALAGAPPAN ,  AMADURI BRUNO ,  LOPEZ GERALD

    IPC: C08F293/00 ,  C08F2/38 ,  C08F214/24

    CPC classification number: C08F214/242 ,  C08F2/38 ,  C08F214/24 ,  C08F293/005 ,  C08F2438/00

    Abstract: Methods for the synthesis of CTFE-based block copolymers through iodine transfer polymerization are disclosed. In an exemplary embodiment, a method includes reacting a fluoromonomer “M” with a chain transfer agent of the formula X—Y or Y—X—Y, wherein X represents a C1-C3 hydrocarbon, a C1-C6 hydrofluorocarbon, C1-C6 hydrochlorofluorocarbon, or C1-C6 fluorocarbon and Y represents iodine or bromine, in the presence of a radical initiator, to form a macro-initiator of the formula: X-poly(M)-Y or Y-poly(M)-X-poly(M)-Y, wherein poly(M) represents a polymer of the fluoromonomer. The method further includes reacting the macro-initiator with chlorotrifluoroethylene (CTFE) in the presence of a radical initiator to form a diblock or a triblock CTFE-based block copolymer of the formula: X-poly(M)-block-poly(CTFE) or PCTFE-block-poly(M)-X-poly(M)-block-PCTFE.

    Abstract translation: 公开了通过碘转移聚合合成CTFE基嵌段共聚物的方法。 在一个示例性实施方案中，一种方法包括使含氟单体“M”与式X-Y或Y-X-Y的链转移剂反应，其中X表示C1-C3烃，C1-C6氢氟烃，C1-C6 氯代氟代烃或C1-C6碳氟化合物，Y代表碘或溴，在自由基引发剂的存在下形成下式的大分子引发剂：X-聚（M）-Y或Y-聚（M）-X- 聚（M）-Y，其中聚（M）表示所述含氟单体的聚合物。 该方法还包括在自由基引发剂存在下使大分子引发剂与氯三氟乙烯（CTFE）反应以形成下式的二嵌段或三嵌段CTFE基嵌段共聚物：X-聚（M） - 嵌段 - 聚（CTFE） 或PCTFE-嵌段 - 聚（M）-X-聚（M） - 嵌段-PCPFE。

    Proceso, propiedades y aplicaciones de copolímeros de injerto
    9.
    发明专利
    Proceso, propiedades y aplicaciones de copolímeros de injerto 未知

    公开(公告)号：ES2725804T3

    公开(公告)日：2019-09-27

    申请号：ES12858659

    申请日：2012-12-14

    Applicant: HONEYWELL INT INC

    Inventor： THENAPPAN ALAGAPPAN ,  RAINAL ERIC ,  AMEDURI BRUNO ,  BOSCHET FREDERIC ,  AJELLAL NOUREDDINE ,  LOPEZ GERALD

    IPC: C08F259/00 ,  C08F259/02 ,  C08F259/08 ,  C08J5/18 ,  C08L27/00

    Abstract: Un proceso para la síntesis de copolímeros de injerto PCTFE-(poli-clorotrifluoroetileno)-g-poli(M), comprendiendo el procedimiento: a) proporcionar una molécula que tiene la fórmula: X-[C(A)2C(B)(B')]n-Q[CY=C(Z)(Z')] o [C(A)2=C(B)]n-Q[C(Y)(10 Y')-C(Z)(Z')]-X', en las que A es H o F; B y B' son H, F o Cl, y no son necesariamente iguales; X y X' son Br, Cl o I (y no son necesariamente iguales); Y e Y' son F, Br, Cl o I (y no son necesariamente iguales); y en la que Z y Z' son F, Br, Cl o I (y no son necesariamente iguales); Q es opcional y es oxígeno (O) o azufre (S); y n es al menos 1; y b) hacer reaccionar la molécula X-[C(A)2C(B)(B')]n-Q[CY=C(Z)(Z')] o [C(A)2=C(B)]n-Q[C(Y)(Y')-C(Z)(Z')]-X' con un monómero CTFE en presencia de un iniciador por radicales libres, formando así el monómero CTFE para dar un componente de esqueleto del copolímero de injerto poli-CTFE que tiene uno o más componentes monoméricos colgantes X'-[C(A)2C(B)(B')]n- o -[C(Y)(Y')-C(Z)(Z')]-X' unidos al mismo.

    CHLOROFLUOROPOLYMER COATED SUBSTRATES FOR PACKAGING MATERIALS
    10.
    发明专利
    CHLOROFLUOROPOLYMER COATED SUBSTRATES FOR PACKAGING MATERIALS 未知

    公开(公告)号：CA2884590C

    公开(公告)日：2021-08-24

    申请号：CA2884590

    申请日：2013-09-12

    Applicant: HONEYWELL INT INC

    Inventor： RAINAL ERIC ,  KERKAR AWDHOOT VASANT ,  THENAPPAN ALAGAPPAN

    IPC: D21H19/24

    Abstract: Disclosed is a coated substrate, which includes a substrate comprising a cellulosic fiber material and a copolymer coated in a thin film on at least one surface of the substrate. The copolymer has at least two comonomer units of the formula: CX2CYA, wherein each X is independently selected from the group consisting of H, C1 and F; Y is selected from the group consisting of H, C1, F, O(CZ2)nCZ3, (CZ2)nCZ3, (OCZ2CZ2)nCZ3 and (O(CZ2)n)nCZ3, wherein each n is independently from about 1 to about 12 and each Z is independently selected from the group consisting of H, Cl and F; and A is selected from the group consisting of H, Cl and F; provided that for at least one comonomer unit, at least one of A, Y, and either X or any Z is C1.

Patent Agency Ranking