MULTIPLE GRID FABRICATION METHOD
    1.
    发明申请
    MULTIPLE GRID FABRICATION METHOD 审中-公开
    多网格制作方法

    公开(公告)号:WO1980001019A1

    公开(公告)日:1980-05-15

    申请号:PCT/US1979000822

    申请日:1979-09-28

    CPC classification number: H01J9/14

    Abstract: Method of fabricating an improved multiple grid electrode having a plurality of discs by simultaneously forming a dimpled segment in a sandwich structure consisting of metallic discs (42, 43, 44) separated by spacer material (46, 47). The dimpled sandwich structure is then machined, forming a series of vanes on the dimpled portion by an appropriate method, such as electrical discharge. After machining, the spacer material (46, 47) is etched away, leaving only the vaned discs, (42, 43, 44) forming grid electrodes.

    Abstract translation: 通过同时形成由间隔物材料(46,47)分隔的金属盘(42,43,44)构成的夹层结构中的凹坑段来制造具有多个盘的改进的多栅格电极的方法。 然后将凹坑夹层结构加工,通过适当的方法(如放电)在凹陷部分上形成一系列叶片。 在加工之后,间隔材料(46,47)被蚀刻掉,仅留下形成网格电极的扇形盘(42,43,44)。

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