公开(公告)号：AU2003265462A1

公开(公告)日：2004-03-11

申请号：AU2003265462

申请日：2003-08-15

Applicant: HYPERNEX INC

Inventor： KOZACZEK KRZYSZTOF J ,  KURTZ DAVID S ,  MORAN PAUL R ,  MARTIN ROGER I ,  DEHAVEN PATRICK W ,  RODBELL KENNETH P ,  MALHOTRA SANDRA G

IPC: G01B15/02 ,  G01N23/20

公开(公告)号：AU2003265462A8

公开(公告)日：2004-03-11

申请号：AU2003265462

申请日：2003-08-15

Applicant: IBM ,  HYPERNEX INC

Inventor： KOZACZEK KRZYSZTOF J ,  KURTZ DAVID S ,  MORAN PAUL R ,  MARTIN ROGER I ,  DEHAVEN PATRICK W ,  RODBELL KENNETH P ,  MALHOTRA SANDRA G

IPC: G01B15/02 ,  G01N23/20

公开(公告)号：WO2004018959A3

公开(公告)日：2004-10-07

申请号：PCT/US0325769

申请日：2003-08-15

Applicant: HYPERNEX INC ,  IBM

Inventor： KOZACZEK KRZYSZTOF J ,  KURTZ DAVID S ,  MORAN PAUL R ,  MARTIN ROGER I ,  DEHAVEN PATRICK W ,  RODBELL KENNETH P ,  MALHOTRA SANDRA G

IPC: G01B15/02 ,  G01N23/20 ,  G01N23/223

CPC classification number: G01N23/20 ,  G01B15/02

Abstract: An apparatus and method for mapping film thickness of one or more textured polycrystalline thin films. Multiple sample films of known thickness are provided. Each sample film is irradiated by x-ray at a measurement point to generate a diffraction image that captures a plurality of diffraction arcs. Texture information (i.e., pole densities) of the sample film is calculated based on incomplete pole figures collected on the diffraction image and used to correct the x-ray diffraction intensities from such sample. The corrected diffraction intensities are integrated for each sample film, and then used for constructing a calibration curve that correlates diffraction intensities with respective known film thickness of the sample films. The film thickness of a textured polycrystalline thin film of unknown thickness can therefore be mapped on such calibration curve, using a corrected and integrated diffraction intensity obtained for such thin film of unknown thickness.

Abstract translation: 一种用于映射一个或多个纹理化多晶薄膜的膜厚度的装置和方法。 提供了已知厚度的多个样品膜。 每个样品膜在测量点用X射线照射以产生捕获多个衍射弧的衍射图像。 基于在衍射图像上收集的不完整极点图来计算样品膜的纹理信息（即极密度）并且用于校正来自该样品的x射线衍射强度。 校正的衍射强度对每个样品膜进行积分，然后用于构建使衍射强度与样品膜的相应已知膜厚相关的校准曲线。 因此，使用针对这种未知厚度的薄膜获得的校正和积分衍射强度，可以将具有未知厚度的纹理化多晶薄膜的膜厚度映射到这种校准曲线上。

公开(公告)号：EP1540276A4

公开(公告)日：2006-08-23

申请号：EP03793095

申请日：2003-08-15

Applicant: HYPERNEX INC ,  IBM

Inventor： KOZACZEK KRZYSZTOF J ,  KURTZ DAVID S ,  MORAN PAUL R ,  MARTIN ROGER I ,  DEHAVEN PATRICK W ,  RODBELL KENNETH P ,  MALHOTRA SANDRA G

IPC: G01B15/02 ,  G01N23/20 ,  G01N23/223

CPC classification number: G01N23/20 ,  G01B15/02

Abstract: An apparatus and method for mapping film thickness of one or more textured polycrystalline thin films. Multiple sample films of known thickness are provided. Each sample film is irradiated by x-ray at a measurement point to generate a diffraction image that captures a plurality of diffraction arcs. Texture information (i.e., pole densities) of the sample film is calculated based on incomplete pole figures collected on the diffraction image and used to correct the x-ray diffraction intensities from such sample. The corrected diffraction intensities are integrated for each sample film, and then used for constructing a calibration curve that correlates diffraction intensities with respective known film thickness of the sample films. The film thickness of a textured polycrystalline thin film of unknown thickness can therefore be mapped on such calibration curve, using a corrected and integrated diffraction intensity obtained for such thin film of unknown thickness.