1.
    发明专利
    未知

    公开(公告)号:DE69522934T2

    公开(公告)日:2002-04-04

    申请号:DE69522934

    申请日:1995-02-07

    Applicant: IBM

    Abstract: PCT No. PCT/EP95/00431 Sec. 371 Date Oct. 3, 1996 Sec. 102(e) Date Oct. 3, 1996 PCT Filed Feb. 7, 1995 PCT Pub. No. WO96/24819 PCT Pub. Date Aug. 15, 1996A new method and an apparatus for measuring the deflection of or the force exerted upon a cantilever-type micromechanical element is presented which is based on detecting radiation emitted from the gap between the cantilever (220) and a second surface (230, 231). The radiation, while occurring spontaneously at high frequencies when appropriately biasing the cantilever and the second surface by a voltage, can be enlarged by using external energy sources. The new method and apparatus is also applied to surface investigation, particularly to dopant profiling.

    2.
    发明专利
    未知

    公开(公告)号:DE69522934D1

    公开(公告)日:2001-10-31

    申请号:DE69522934

    申请日:1995-02-07

    Applicant: IBM

    Abstract: PCT No. PCT/EP95/00431 Sec. 371 Date Oct. 3, 1996 Sec. 102(e) Date Oct. 3, 1996 PCT Filed Feb. 7, 1995 PCT Pub. No. WO96/24819 PCT Pub. Date Aug. 15, 1996A new method and an apparatus for measuring the deflection of or the force exerted upon a cantilever-type micromechanical element is presented which is based on detecting radiation emitted from the gap between the cantilever (220) and a second surface (230, 231). The radiation, while occurring spontaneously at high frequencies when appropriately biasing the cantilever and the second surface by a voltage, can be enlarged by using external energy sources. The new method and apparatus is also applied to surface investigation, particularly to dopant profiling.

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