公开(公告)号：JPH1116878A

公开(公告)日：1999-01-22

申请号：JP15962198

申请日：1998-06-08

Applicant: IBM

Inventor： KRISHUNA GANDE SACHIDEF ,  UMAA MOEZU UDEIN AMADO ,  KNICKERBOCKER JOHN ULRICH ,  CHON CHEON REI

IPC: C11D7/26 ,  C11D7/50 ,  C11D11/00 ,  H01L21/304 ,  H01L21/48 ,  H05K3/26

Abstract: PROBLEM TO BE SOLVED: To effectively remove flux residue of rosin base formed during high temperature solder reflow by using at least one non-halogenation/non-aromatic solvent as solvent when washing residue off at least one surface of a semiconductor device. SOLUTION: In a solvent washing process for washing residue off at least one surface of a semiconductor device, at least one non-halogenation/non- aromatic solvent is used as solvent. A solvent having at least two functional groups comprising that expressed by -OH and -COOR, -OR and -COOR, -OH and -OR, -OR and -OCOR [R is expressed by CnH2n+1 (n=1 to 4)] is suitable. Embodiments of the washing solvent are lactic ester, alkoxyalkyl ester, propylene glycol ether alkoxylate and that selected from a combination thereof.