公开(公告)号：US3573975A

公开(公告)日：1971-04-06

申请号：US3573975D

申请日：1968-07-10

Applicant: IBM

Inventor： DHAKA VIR A ,  CLARK EDWIN R ,  PINCK ARNOLD

IPC: G03F7/20 ,  G03C5/00

CPC classification number: G03F7/2041

Abstract: IN A PHOTOCHEMICAL FABRICATION PROCESS WHEREIN A PHOTORESIST LAYER IS IMAGE-WISE EXPOSED BY CONTACT EXPOSURE THROUGH A MASK, THE IMPROVEMENT OF PROVIDING A LIQUID INTERFACE BETWEEN THE PHOTORESIST LAYER AND MASK PRIOR AND DURING EXPOSURE.

公开(公告)号：CA915494A

公开(公告)日：1972-11-28

申请号：CA915494D

Applicant: IBM

Inventor： CLARK EDWIN R ,  DHAKA VIR A ,  PINCK ARNOLD

IPC: G03C5/00 ,  G03F7/20