公开(公告)号：DE69403816T2

公开(公告)日：1998-01-15

申请号：DE69403816

申请日：1994-01-05

Applicant: IBM

Inventor： CUOMO JEROME J ,  GUARNIERI C RICHARD ,  HOPWOOD JEFFREY A

IPC: C23C14/00 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/46

Abstract: A shield (124) for shunting capacitive electric fields generated by an RF coil (116) away from a gas plasma process chamber's dielectric window (122) and toward ground. The shield comprises an electrically conducting, substantially planar body section having a periphery and adapted to be located between the RF coil and the dielectric window during plasma treating of a workpiece. A central opening in the body section and gaps about the periphery permit RF magnetic fields to inductively couple with the plasma (110) and return around the coil, respectively. The shield substantially reduces interference by capacitive electric fields generated by the coil with inductive coupling between the coil and the gas plasma, thus substantially eliminating contamination from sputtering of the dielectric window by the capacitive electric fields.

公开(公告)号：DE69403816D1

公开(公告)日：1997-07-24

申请号：DE69403816

申请日：1994-01-05

Applicant: IBM

Inventor： CUOMO JEROME J ,  GUARNIERI C RICHARD ,  HOPWOOD JEFFREY A

IPC: C23C14/00 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/46

Abstract: A shield (124) for shunting capacitive electric fields generated by an RF coil (116) away from a gas plasma process chamber's dielectric window (122) and toward ground. The shield comprises an electrically conducting, substantially planar body section having a periphery and adapted to be located between the RF coil and the dielectric window during plasma treating of a workpiece. A central opening in the body section and gaps about the periphery permit RF magnetic fields to inductively couple with the plasma (110) and return around the coil, respectively. The shield substantially reduces interference by capacitive electric fields generated by the coil with inductive coupling between the coil and the gas plasma, thus substantially eliminating contamination from sputtering of the dielectric window by the capacitive electric fields.