公开(公告)号：DE69121261T2

公开(公告)日：1997-02-20

申请号：DE69121261

申请日：1991-02-07

Applicant: IBM

Inventor： HOPEWELL WILLIAM D ,  JACKSON ROBERT R ,  SHAW JERRY C ,  VAN KESSEL THEODORE G

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G02B21/00 ,  G01B9/02

Abstract: Measurement apparatus and procedure for use with lithographic equipment is provided for the construction of electronic and other devices wherein a photoresist is deposited as a layer upon a substrate (20). A Nomarski differential interference contrast microscope (62) in conjunction with a scanned image detector is employed to examine verification marks (28, 30) produced by projection of an overlay, such as the mask or reticle (94), upon the photoresist layer. The projection results in a production of verification marks (28, 30) in the form of a latent image which, while invisible with conventional viewing means, can be viewed by phase-contrast imaging employing differential phase shift. Various characteristics of the resultant image are employed to align secondary verification marks (30) with primary verification marks (28) previously provided on the substrate (20), and to allow for a checking of line width, dosage, focusing, temperature control, and global alignment. Observation of the photoresist is accomplished with radiation at lower frequency than the exposure radiation, the latter being significantly absorbed, by the photoresist, the photoresist being transparent to the observation radiation to permit reflection from top and bottom surfaces of the photoresist.

公开(公告)号：DE69121261D1

公开(公告)日：1996-09-19

申请号：DE69121261

申请日：1991-02-07

Applicant: IBM

Inventor： HOPEWELL WILLIAM D ,  JACKSON ROBERT R ,  SHAW JERRY C ,  VAN KESSEL THEODORE G

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G02B21/00 ,  G01B9/02

Abstract: Measurement apparatus and procedure for use with lithographic equipment is provided for the construction of electronic and other devices wherein a photoresist is deposited as a layer upon a substrate (20). A Nomarski differential interference contrast microscope (62) in conjunction with a scanned image detector is employed to examine verification marks (28, 30) produced by projection of an overlay, such as the mask or reticle (94), upon the photoresist layer. The projection results in a production of verification marks (28, 30) in the form of a latent image which, while invisible with conventional viewing means, can be viewed by phase-contrast imaging employing differential phase shift. Various characteristics of the resultant image are employed to align secondary verification marks (30) with primary verification marks (28) previously provided on the substrate (20), and to allow for a checking of line width, dosage, focusing, temperature control, and global alignment. Observation of the photoresist is accomplished with radiation at lower frequency than the exposure radiation, the latter being significantly absorbed, by the photoresist, the photoresist being transparent to the observation radiation to permit reflection from top and bottom surfaces of the photoresist.

公开(公告)号：CA2102881A1

公开(公告)日：1994-09-13

申请号：CA2102881

申请日：1993-11-10

Applicant: IBM

Inventor： BATCHELDER JOHN S ,  HALL SHAWN A ,  JACKSON ROBERT R

IPC: F04C2/00 ,  B29C47/60 ,  B29C48/395 ,  F04D3/02 ,  F04D29/18 ,  F04C13/00

Abstract: CONICAL LOGARITHMIC SPIRAL VISCOSITY PUMP A rotary viscosity pump is provided that has a housing and an impeller. The housing has a conical chamber with an outlet at a narrow end of the chamber. The impeller has a conical section with a logarithmic spiral groove along its exterior. The spacing between the housing and the impeller can have either a constant gap or a gap that decreases along the length of the impeller. The depth of the groove can be constant, increase, or decrease in depth along the length of the impeller.