10.
    发明专利
    未知

    公开(公告)号:DE1621090A1

    公开(公告)日:1971-04-22

    申请号:DE1621090

    申请日:1967-07-10

    Applicant: IBM

    Abstract: 1,166,901. Electrolytic etching. INTERNATIONAL BUSINESS MACHINES CORP. June 26, 1967 [July 15, 1966], No. 29309/67. Heading C7B. In electrolytically etching alloys of Be-Cu, Be-Cu-Co or Ni-Fe-P as anodes, the electrolyte comprises aqueous fluosilicic acid (H 2 Si F 6 ) as the major component by volume and ethylene glycol. It may also comprise hydroxylamine hydrochloride, 2, 2 1 diquinoline and isopropyl alcohol. Cathodes of Cu or stainless steel and anodic current densities of 50-2000 amps/sq. ft. may be employed. Shaped cathodes, current shields and current thieves may be used to effect overall uniform attack. Areas may be coated with resist material and areas may be etched right through to form chain like structures. The electrolyte may contain agents to alter its conductivity and viscosity. The amount of metal removed can be controlled by using ampere-hour meters.

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