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Patent Agency Ranking
公开(公告)号：IT1165359B
公开(公告)日：1987-04-22
申请号：IT2705479
申请日：1979-11-06
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , LINFORD VIGAR JAMES MICHAEL
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公开(公告)号：IT1149881B
公开(公告)日：1986-12-10
申请号：IT2210880
申请日：1980-05-16
Applicant: IBM
Inventor： LINFORD VIGAR JAMES MICHAEL
Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.
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公开(公告)号：ZA828368B
公开(公告)日：1983-09-28
申请号：ZA828368
申请日：1982-11-15
Applicant: IBM
Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.
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