1.
    发明专利
    未知

    公开(公告)号:DE2621791A1

    公开(公告)日:1976-12-30

    申请号:DE2621791

    申请日:1976-05-15

    Applicant: IBM

    Abstract: A clamped epi-base NPN transistor with very short saturation time constant is obtained by ion implantation in the P-type base region to convert a portion thereof to N conductivity type contiguous to the collector reach-through region. The converted region is contacted by an extended metal electrode which also contacts the base region. The metal electrode establishes ohmic contact to the base region and Schottky diode contact to the converted region and to the collector region connected thereto.

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