Improvements in or relating to methods of Electrolytically Etching Metal Layers

    公开(公告)号:GB1178554A

    公开(公告)日:1970-01-21

    申请号:GB1104767

    申请日:1967-03-09

    Applicant: IBM

    Abstract: 1,178,554. Electrolytic etching and polishing. INTERNATIONAL BUSINESS MACHINES CORP. March 9, 1967, No.11047/67. Hdading C7B. A metal layer on an article is electrolytically etched or polished in an electrolyte which floats on a second liquid and the article is then passed into the second liquid where no etching or polishing occurs. The Figure illustrates uniform electrolytic removal of a Cr layer 5 from an article 7 using an aqueous electrolyte 3, comprising NaOH and Na 2 CO 3 , which floats on an inert liquid 2 such as trichlorethylene trichlorotrifluoroethane or glycerol. In operation, the article is connected as anode and a stainless steel electrode 4 is connected as cathode. The article 7 is then lowered into the electrolyte 3 at a uniform speed. When the whole of the article 7 has been lowered through the electrolyte 3 into the liquid 2 the power supply is switched off. The article is then removed, washed and dried. Removal of Cr from a SiO substrate in making a printed circuit is referred to.

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