Patent search ap:("IBM") AND inv:"RANII DABURIYUU KONGU" Page 1

1.

发明专利
RESIST FOR LITHOGRAPHY 失效

公开(公告)号：JPS61289345A

公开(公告)日：1986-12-19

申请号：JP12241386

申请日：1986-05-29

Applicant: IBM

Inventor： RANII DABURIYUU KONGU , HAABANSU ESU SACHIDEBU , KURISHIYUNA GANJII SACHIDEBU

IPC: G03F7/039 , G03C1/00 , G03C1/72 , G03F7/11 , H01L21/30

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