公开(公告)号：WO2012148659A3

公开(公告)日：2013-02-28

申请号：PCT/US2012032887

申请日：2012-04-10

Applicant: IBM ,  BAJJURI KRISHNA ,  DAI QIU ,  NELSON ALSHAKIM ,  RATHORE JITENDRA

Inventor： BAJJURI KRISHNA ,  DAI QIU ,  NELSON ALSHAKIM ,  RATHORE JITENDRA

IPC: C08G77/42 ,  C08G77/06 ,  C08J5/18 ,  C08J9/00 ,  C08L83/10

CPC classification number: C08J3/24 ,  C08G77/38 ,  C08G77/445 ,  C08J2383/04

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

Abstract translation: 提供的是在不添加前体的情况下自组装的无机 - 有机嵌段共聚物。 聚合物的无机嵌段包括硅，有机嵌段可以是任何有机聚合物。 无机 - 有机嵌段共聚物自组装形成其中无机聚合物嵌段可以交联以产生有机硅酸盐和/或二氧化硅基质的材料，并且基质的进一步热固化导致多孔纳米结构膜的形成。

公开(公告)号：DE112012001915T5

公开(公告)日：2014-01-23

申请号：DE112012001915

申请日：2012-04-10

Applicant: IBM

Inventor： DAI QIU ,  RATHORE JITENDRA ,  BAJJURI KRISHNA ,  NELSON ALSHAKIM

IPC: C08G77/42 ,  C08G77/06 ,  C08J5/18 ,  C08J9/00 ,  C08L83/10

Abstract: Es werden anorganisch-organische Block-Copolymere bereitgestellt, die sich ohne die Hinzufügung einer Vorläuferverbindung selbst organisieren. Der anorganische Block der Polymere beinhaltet Silicium, und der organische Block kann irgendein organisches Polymer sein. Die anorganisch-organischen Block-Copolymere organisieren sich selbst, um ein Material zu bilden, in dem der anorganische Polymerblock quervernetzt werden kann, um eine Organosilicat- und/oder Siliciumdioxid-Matrix zu erzeugen, und ein weiteres thermisches Härten der Matrix resultiert in der Bildung einer porösen nanostrukturierten Dünnschicht.

公开(公告)号：GB2501662B

公开(公告)日：2014-01-08

申请号：GB201315436

申请日：2012-04-10

Applicant: IBM

Inventor： BAJJURI KRISHNA ,  DAI QUI ,  NELSON ALSHAKIM ,  RATHORE JITENDRA

IPC: C08G77/42 ,  C08G77/06 ,  C08J5/18 ,  C08J9/00 ,  C08L83/10

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

公开(公告)号：GB2501662A

公开(公告)日：2013-10-30

申请号：GB201315436

申请日：2012-04-10

Applicant: IBM

Inventor： BAJJURI KRISHNA ,  DAI QUI ,  NELSON ALSHAKIM ,  RATHORE JITENDRA

IPC: C08G77/42 ,  C08G77/06 ,  C08J5/18 ,  C08J9/00 ,  C08L83/10

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.