公开(公告)号：JPH1112373A

公开(公告)日：1999-01-19

申请号：JP11387498

申请日：1998-04-23

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  KWANG-YUNG R CHEN ,  ROBERT KENNETH RIIDI ,  WAYNE MARTIN MORROW

IPC: C08J7/00 ,  C08J7/14 ,  H01L21/027 ,  H05F1/00 ,  H05F1/02

Abstract: PROBLEM TO BE SOLVED: To provide an electric charge-vanishing polymer film and a method for bringing the film to be electric charge-vanishing in the situation. SOLUTION: This electric charge-vanishing film can be used as resists for nondestructive SEM measurements, electron beam lithographies and ESD- protecting coatings for electronic parts/products. The method for bringing the polymer film to be electric charge-vanishing consists of a process for laying a polymer having ionic functional groups on the surface and a process for treating the surface with a first chemical substance to bring the ionic functional groups to an ionized state. The surface can be brought back to a nonionized state by exposing the ionized surface to charged beams or electrostatic charges, then exposing the ionized surface to a second chemical substance.