Sputtering apparatus having a concave source cathode
    1.
    发明授权
    Sputtering apparatus having a concave source cathode 失效
    具有阴影源阴极的溅射装置

    公开(公告)号:US3669871A

    公开(公告)日:1972-06-13

    申请号:US3669871D

    申请日:1969-09-10

    Applicant: IBM

    CPC classification number: C23C14/3478

    Abstract: Sputtering apparatus in which the sputtering cathode is concave to produce a focusing effect on dislodged particles and concentrate the particles toward a point. The substrate being coated is movably mounted to construct the desired coating configuration. A modification is to orient single crystal bits on the cathode surface to further enhance preferential directional emission during sputtering.

    Abstract translation: 溅射装置,其中溅射阴极是凹的,以产生对移动的颗粒的聚焦效应并将颗粒集中在一个点上。 被涂覆的基材可移动地安装以构成所需的涂层构型。 修改是在阴极表面上定向单晶位以进一步增强溅射期间的优先定向发射。

    DOCUMENT PROCESSOR INCLUDING METHOD AND APPARATUS FOR IDENTIFYING AND CORRECTING ERRORS

    公开(公告)号:CA2036274A1

    公开(公告)日:1991-09-16

    申请号:CA2036274

    申请日:1991-02-13

    Applicant: IBM

    Abstract: DOCUMENT PROCESSOR INCLUDING METHOD AND APPARATUS FOR IDENTIFYING AND CORRECTING ERRORS A method and system for identifying errors in recognition and for correcting such errors. During the recognition process, the most likely (or primary recognition) character and a second or alternative character (representing the next most likely recognition) together with a probability of the most likely character being correct. When an error is detected, as by the recognized characters on individual documents not totalling the total on a summary document, then characters with lowest probability in the correct place value are examined until the replacement of an alternate character for the most likely character allows the characters on the individual documents total the total on the summary document.

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