公开(公告)号：KR870000774Y1

公开(公告)日：1987-02-28

申请号：KR830009501

申请日：1983-11-09

Applicant: IBM

Inventor： SAITO AKIO

IPC: G09G5/24 ,  G09G1/00 ,  G09G1/02 ,  G09G1/06

Abstract: 내용없음.

公开(公告)号：JP2004029089A

公开(公告)日：2004-01-29

申请号：JP2002181130

申请日：2002-06-21

Applicant: Internatl Business Mach Corp ,  Jsr Corp ,  Jsr株式会社 ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NISHIMURA YUKIO ,  NISHIMURA ISAO ,  SAITO AKIO ,  KOBAYASHI HIDEKAZU ,  TOMAS I WOROU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation and suitable for use as a chemically sensitized resist excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociating group-containing resin containing a (meth)acrylic ester repeating unit typified by a unit derived from 2-ethyladamantan-2-yl ester or 1-methylcyclopentyl ester of (meth)acrylic acid and a repeating unit having a norbornane skeleton in the backbone typified by a unit derived from 1-methylcyclopentyl ester or (2-ethyladamantan-2-yl) ester of a bicyclo[2,2,1]hept-2-ene-5-carboxylic acid and not containing a repeating unit derived from maleic anhydride and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO