公开(公告)号：DE3378372D1

公开(公告)日：1988-12-08

申请号：DE3378372

申请日：1983-05-27

Applicant: IBM

Inventor： MONDOU EUGENE RAYMOND ,  SCHNEIDER FREDERICK WILLIAM

IPC: B41N3/00 ,  B41F35/00 ,  B41N1/24 ,  B41N3/06 ,  C11D7/26 ,  C11D7/32 ,  C11D7/50 ,  H05K3/12

Abstract: A process for cleaning both polar and non-polar residue material from screening masks, wherein the mask is contacted with a liquid solvent that at least includes a solvent selected from the group consisting of N-cyclohexyl-2-pyrrolidone, N-isopropyl-2-pyrrolidone, ethyl hexyl acetate, dibutyl carbitol and Magie Oil #6543.