公开(公告)号：DE2433493A1

公开(公告)日：1975-03-13

申请号：DE2433493

申请日：1974-07-12

Applicant: IBM

Inventor： HARPER JOHN SANFORD ,  LEAN ERIC GUNG HWA ,  SPILLER EBERHARD ADOLF ,  WILCZYNSKI JANUSZ STANISLAW

IPC: G02B6/122 ,  G02B6/124 ,  G02B9/00 ,  G02B5/14

公开(公告)号：DE2628099A1

公开(公告)日：1977-02-03

申请号：DE2628099

申请日：1976-06-23

Applicant: IBM

Inventor： FEDER RALPH ,  SPILLER EBERHARD ADOLF

IPC: H01L21/027 ,  G03F1/22 ,  G03F7/004 ,  G03F7/20 ,  H05K3/00 ,  H05K3/10 ,  G03F1/00

Abstract: A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.