公开(公告)号：KR850000620B1

公开(公告)日：1985-05-01

申请号：KR790004288

申请日：1979-12-05

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

IPC: C25D3/06 ,  C25D3/04

Abstract: In a Cr electroplating soln., the source of Cr comprises an equilibrated aq. soln. of Cr(III) thiocyanate complexes. The Cr concn. is up to 0.02 molar. The soln. includes an amino acid as pH buffer, providing at least 1 of the ligands for the complex. Pref. the amino acid is aspartic acid. The ratio of the molar concns. of Cr to thiocyanate is 1:2-1:4. Aspartic acid concn. is ca. 1.25 times that of Cr. The bath gives a deposit of light colour and is also used to plate the initial layer of a thick (above 5 microns) deposit for engineering applications.

公开(公告)号：DD147373A5

公开(公告)日：1981-04-01

申请号：DD21714279

申请日：1979-11-26

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

IPC: C25D3/04

公开(公告)号：CS214811B2

公开(公告)日：1982-06-25

申请号：CS764979

申请日：1979-11-09

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

IPC: C25D3/06 ,  C25D3/10 ,  C25D5/14

Abstract: A very low concentration trivalent chromium plating bath in which the source of chromium is an aqueous solution of a chromium (III)- thiocyanate complex (Cr less than 0.03 M) gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium and may replace the rinse tank of a first chromium (III)- thiocyanate process which is optimized for efficiency and bath stability rather than colour.

公开(公告)号：CA960356A

公开(公告)日：1974-12-31

申请号：CA147826

申请日：1972-07-25

Applicant: IBM

Inventor： HEARN BRIAN R ,  KINGTON BRIAN W ,  PATON ANDREW ,  JONES ARTHUR S ,  VIGAR JAMES M L ,  PASCUAL RAFAEL

IPC: G11B5/187 ,  G11B5/245 ,  G11B5/31

公开(公告)号：CA1195646A

公开(公告)日：1985-10-22

申请号：CA372416

申请日：1981-03-05

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

IPC: C25D3/06 ,  C25D3/10

Abstract: TRIVALENT CHROMIUM ELECTROPLATING SOLUTION INCLUDING THIOCYANATE AND ALKALI METAL SULPHATES A chromium electroplating solution in which the source of chromium comprises an equilibrated aqueous solution of chromium (III) - thiocyanate complexes and which has a supporting electrolyte consisting essentially of potassium sulphate or, preferably, a mixture of potassium and sodium sulphates. Such a solution is employed as the catholyte in a plating bath in which catholyte and anolyte are separated by a cation exchange membrane. This all sulphate bath permits the employment of lead anodes and has high efficiency and a good plating range.

公开(公告)号：CA1150185A

公开(公告)日：1983-07-19

申请号：CA339759

申请日：1979-11-13

Applicant: IBM

Inventor： BARCLAY DONALD J ,  VIGAR JAMES M L

IPC: C25D3/06 ,  C25D5/14

Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light colour. Such a bath is employed to produce thin overcoatings of light coloured chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

公开(公告)号：CA1141328A

公开(公告)日：1983-02-15

申请号：CA349997

申请日：1980-04-16

Applicant: IBM

Inventor： VIGAR JAMES M L

IPC: C25D3/06

Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.