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    1.
    发明专利
    未知

    公开(公告)号：FR2460344A1

    公开(公告)日：1981-01-23

    申请号：FR8007271

    申请日：1980-03-27

    Applicant: IBM

    Inventor： VIGAR JAMES MICHAEL

    IPC: C25D3/06

    Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.

    ELECTRODEPOSITION OF CHROMIUM
    4.
    发明专利
    ELECTRODEPOSITION OF CHROMIUM 未知

    公开(公告)号：AU9068282A

    公开(公告)日：1983-05-26

    申请号：AU9068282

    申请日：1982-11-18

    Applicant: IBM

    Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL ,  MORGAN WILLIAM MORRIS

    IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

    6.
    发明专利
    未知

    公开(公告)号：FI793514A

    公开(公告)日：1980-05-12

    申请号：FI793514

    申请日：1979-11-09

    Applicant: IBM

    Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL

    IPC: C25D3/06 ,  C25D5/14 ,  C25D

    Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

    ELECTRODEPOSITION OF CHROMIUM
    7.
    发明专利
    ELECTRODEPOSITION OF CHROMIUM 未知

    公开(公告)号：AU556367B2

    公开(公告)日：1986-10-30

    申请号：AU9068282

    申请日：1982-11-18

    Applicant: IBM

    Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL ,  MORGAN WILLIAM MORRIS

    IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

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